Inventor · disambiguated record
Bayram Yenikaya
Also filed as: YENIKAYA BAYRAM
8 granted patents·2 pending applications·330 citations·filing 2005–2023
88Inventor score
Top patents by PatentIndex Score
10 records- 0198US7568174B2Method for checking printability of a lithography targetCADENCE DESIGN SYSTEMS INC·Filed 2006·Granted Jul 28, 2009·185 cites·33 claims
- 0295US7600212B2Method of compensating photomask data for the effects of etch and lithography processesCADENCE DESIGN SYSTEMS INC·Filed 2006·Granted Oct 6, 2009·39 cites·55 claims
- 0394US7849423B1Method of verifying photomask data based on models of etch and lithography processesCADENCE DESIGN SYSTEMS INC·Filed 2007·Granted Dec 7, 2010·61 cites·21 claims
- 0492US10310372B1Full-chip hierarchical inverse lithographyCADENCE DESIGN SYSTEMS INC·Filed 2017·Granted Jun 4, 2019·13 cites·18 claims
- 0589US7913197B1Method for double patterning lithographyCADENCE DESIGN SYSTEMS INC·Filed 2008·Granted Mar 22, 2011·23 cites·24 claims
- 0685US8122389B2Apparatus and method for segmenting edges for optical proximity correctionSEZGINER ABDURRAHMAN·Filed 2010·Granted Feb 21, 2012·4 cites·36 claims
- 0781US7743358B2Apparatus and method for segmenting edges for optical proximity correctionCADENCE DESIGN SYSTEMS INC·Filed 2005·Granted Jun 22, 2010·5 cites·32 claims
- 0861US2024362395A1Layout correction method and mask manufacturing method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 0954US12169678B2Operating method of electronic device for semiconductor memory manufactureSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Dec 17, 2024·0 cites·19 claims
- 1047US2024280891A1Optical proximity correction (opc) method, and methods of manufacturing mask using the opc methodSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →