Inventor · disambiguated record
Katsumi Horiguchi
Also filed as: HORIGUCHI KATSUMI
4 granted patents·3 pending applications·35 citations·filing 2002–2007
74Inventor score
Files withTOKYO ELECTRON LTD6
Top patents by PatentIndex Score
7 records- 0176US7767055B2Capacitive coupling plasma processing apparatusTOKYO ELECTRON LTD·Filed 2005·Granted Aug 3, 2010·5 cites·17 claims
- 0274US7416676B2Plasma etching method and apparatus, control program for performing the etching method, and storage medium storing the control programTOKYO ELECTRON LTD·Filed 2006·Granted Aug 26, 2008·6 cites·10 claims
- 0373US7678225B2Focus ring for semiconductor treatment and plasma treatment deviceTOKYO ELECTRON LTD·Filed 2002·Granted Mar 16, 2010·21 cites·10 claims
- 0449US7109123B2Silicon etching methodTOKYO ELECTRON LTD·Filed 2003·Granted Sep 19, 2006·3 cites·17 claims
- 0541US2008261406A1Etching method and semiconductor device fabrication methodTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 0636US2004222190A1Plasma processing methodTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 0736US2005014372A1Etching method and plasma etching processing apparatusFiled 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →