Inventor · disambiguated record
Wayne M. Moreau
Also filed as: MOREAU WAYNE · MOREAU WAYNE M · MOREAU WAYNE MARTIN
102 granted patents·7 pending applications·2,919 citations·filing 1973–2007
99Inventor score
Top patents by PatentIndex Score
109 records- 0199US6420088B1Antireflective silicon-containing compositions as hardmask layerIBM·Filed 2000·Granted Jul 16, 2002·214 cites·8 claims
- 0298US6558475B1Process for cleaning a workpiece using supercritical carbon dioxideIBM·Filed 2000·Granted May 6, 2003·126 cites·25 claims
- 0398US6503692B2Antireflective silicon-containing compositions as hardmask layerIBM·Filed 2002·Granted Jan 7, 2003·85 cites·9 claims
- 0495US6686124B1Multifunctional polymeric materials and use thereofIBM·Filed 2000·Granted Feb 3, 2004·67 cites·31 claims
- 0595US6420084B1Mask-making using resist having SIO bond-containing polymerIBM·Filed 2000·Granted Jul 16, 2002·83 cites·28 claims
- 0695US5607824AAntireflective coating for microlithographyIBM·Filed 1994·Granted Mar 4, 1997·61 cites·2 claims
- 0794US6346484B1Method for selective extraction of sacrificial place-holding material used in fabrication of air gap-containing interconnect structuresIBM·Filed 2000·Granted Feb 12, 2002·80 cites·12 claims
- 0894US6210856B1Resist composition and process of forming a patterned resist layer on a substrateIBM·Filed 1999·Granted Apr 3, 2001·123 cites·26 claims
- 0994US6057080ATop antireflective coating filmIBM·Filed 1997·Granted May 2, 2000·86 cites·17 claims
- 1094US3934057AHigh sensitivity positive resist layers and mask formation processIBM·Filed 1973·Granted Jan 20, 1976·53 cites·17 claims
- 1193US6685853B1Energy sensitive electrically conductive admixtures, uses thereof, methods of fabrication and structures fabricated therewithIBM·Filed 2000·Granted Feb 3, 2004·79 cites·9 claims
- 1293US6561220B2Apparatus and method for increasing throughput in fluid processingIBM·Filed 2001·Granted May 13, 2003·71 cites·9 claims
- 1392US6451510B1Developer/rinse formulation to prevent image collapse in resistIBM·Filed 2001·Granted Sep 17, 2002·68 cites·5 claims
- 1491US6451375B1Process for depositing a film on a nanometer structureIBM·Filed 2001·Granted Sep 17, 2002·33 cites·11 claims
- 1591US6207787B1Antireflective coating for microlithographyIBM·Filed 1998·Granted Mar 27, 2001·51 cites·7 claims
- 1690US6398875B1Process of drying semiconductor wafers using liquid or supercritical carbon dioxideIBM·Filed 2001·Granted Jun 4, 2002·53 cites·10 claims
- 1790US5744537AAntireflective coating filmsIBM·Filed 1997·Granted Apr 28, 1998·72 cites·5 claims
- 1890US5401614AMid and deep-UV antireflection coatings and methods for use thereofIBM·Filed 1993·Granted Mar 28, 1995·68 cites·5 claims
- 1989US6425956B1Process for removing chemical mechanical polishing residual slurryIBM·Filed 2001·Granted Jul 30, 2002·44 cites·8 claims
- 2088US5554485AMid and deep-UV antireflection coatings and methods for use thereofIBM·Filed 1994·Granted Sep 10, 1996·56 cites·20 claims
- 2186US7709177B2Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereofIBM·Filed 2007·Granted May 4, 2010·7 cites·18 claims
- 2286US6673521B2Supercritical fluid(SCF) silylation processLNTERNAT BUSINESS MACHINES COR·Filed 2000·Granted Jan 6, 2004·27 cites·19 claims
- 2386US5654376APolymeric dyes for antireflective coatingsIBM·Filed 1995·Granted Aug 5, 1997·21 cites·12 claims
- 2485US6203965B1Photoresist comprising blends of photoacid generatorsSHIPLEY CO LLC·Filed 2000·Granted Mar 20, 2001·19 cites·4 claims
- 2585US5659203AReworkable polymer chip encapsulantIBM·Filed 1995·Granted Aug 19, 1997·71 cites·16 claims
- 2685US5272042APositive photoresist system for near-UV to visible imagingIBM·Filed 1991·Granted Dec 21, 1993·68 cites·3 claims
- 2784US6656666B2Topcoat process to prevent image collapseIBM·Filed 2000·Granted Dec 2, 2003·27 cites·16 claims
- 2884US6043003AE-beam application to mask making using new improved KRS resist systemIBM·Filed 1999·Granted Mar 28, 2000·45 cites·19 claims
- 2983US6622507B2Electromechanical device and a process of preparing sameIBM·Filed 2001·Granted Sep 23, 2003·27 cites·16 claims
- 3083US6509136B1Process of drying a cast polymeric film disposed on a workpieceIBM·Filed 2001·Granted Jan 21, 2003·21 cites·11 claims
- 3183US5955222AMethod of making a rim-type phase-shift mask and mask manufactured therebyIBM·Filed 1996·Granted Sep 21, 1999·51 cites·26 claims
- 3283US5164278ASpeed enhancers for acid sensitized resistsIBM·Filed 1990·Granted Nov 17, 1992·41 cites·23 claims
- 3381US5561194APhotoresist composition including polyalkylmethacrylate co-polymer of polyhydroxystyreneIBM·Filed 1995·Granted Oct 1, 1996·54 cites·19 claims
- 3480US6838015B2Liquid or supercritical carbon dioxide compositionIBM·Filed 2001·Granted Jan 4, 2005·20 cites·8 claims
- 3580US6834671B2Check valve for micro electro mechanical structure devicesIBM·Filed 2003·Granted Dec 28, 2004·19 cites·6 claims
- 3680US6736906B2Turbine part mount for supercritical fluid processorIBM·Filed 2002·Granted May 18, 2004·16 cites·28 claims
- 3780US6653045B2Radiation sensitive silicon-containing negative resists and use thereofIBM·Filed 2001·Granted Nov 25, 2003·15 cites·16 claims
- 3880US6454869B1Process of cleaning semiconductor processing, handling and manufacturing equipmentIBM·Filed 2001·Granted Sep 24, 2002·24 cites·9 claims
- 3979US6037097AE-beam application to mask making using new improved KRS resist systemIBM·Filed 1998·Granted Mar 14, 2000·50 cites·35 claims
- 4078US6221568B1Developers for polychloroacrylate and polychloromethacrylate based resistsIBM·Filed 1999·Granted Apr 24, 2001·37 cites·32 claims
- 4178US5240812ATop coat for acid catalyzed resistsIBM·Filed 1991·Granted Aug 31, 1993·35 cites·8 claims
- 4277US6683008B1Process of removing ion-implanted photoresist from a workpieceIBM·Filed 2002·Granted Jan 27, 2004·19 cites·14 claims
- 4376US6543617B2Packaged radiation sensitive coated workpiece process for making and method of storing sameIBM·Filed 2001·Granted Apr 8, 2003·16 cites·49 claims
- 4476US5023164AHighly sensitive dry developable deep UV photoresistIBM·Filed 1989·Granted Jun 11, 1991·26 cites·14 claims
- 4575US7288155B2Method for the rapid thermal control of a work piece in liquid or supercritical fluidIBM·Filed 2005·Granted Oct 30, 2007·3 cites·7 claims
- 4675US6107177ASilylation method for reducing critical dimension loss and resist lossSIEMENS AKTIENESELLSCHAFT·Filed 1999·Granted Aug 22, 2000·47 cites·20 claims
- 4775US5736301AMethod for patterning a photoresist material wherein an anti-reflective coating comprising a copolymer of bisphenol A and benzophenone is usedIBM·Filed 1996·Granted Apr 7, 1998·20 cites·3 claims
- 4875US4880722ADiazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developersIBM·Filed 1987·Granted Nov 14, 1989·25 cites·10 claims
- 4974US8828143B2Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluidSIMONS JOHN P·Filed 2007·Granted Sep 9, 2014·3 cites·12 claims
- 5074US6457480B1Process and apparatus for cleaning filtersIBM·Filed 2001·Granted Oct 1, 2002·9 cites·10 claims
Showing the top 50 of 109 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Wayne M. Moreau files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →