Inventor · disambiguated record
Chan Hwang
Also filed as: HWANG CHAN · HWANG CHAN-SEOK
17 granted patents·13 pending applications·29 citations·filing 2001–2025
89Inventor score
Top patents by PatentIndex Score
30 records- 0193US11137673B1EUV exposure apparatus, and overlay correction method and semiconductor device fabricating method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Oct 5, 2021·4 cites·14 claims
- 0291US11537042B2Overlay correcting method, and photolithography method, semiconductor device manufacturing method and scanner system based on the overlay correcting methodSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Dec 27, 2022·3 cites·20 claims
- 0391US11422455B2EUV exposure apparatus, and overlay correction method and semiconductor device fabricating method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Aug 23, 2022·2 cites·10 claims
- 0486US12451352B2Method for fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Oct 21, 2025·1 cites·20 claims
- 0577US9747682B2Methods for measuring overlaysSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Aug 29, 2017·3 cites·18 claims
- 0674US10566252B2Overlay-correction method and a control system using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Feb 18, 2020·2 cites·20 claims
- 0773US11921421B2Overlay correcting method, and photolithography method, semiconductor device manufacturing method and scanner system based on the overlay correcting methodSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Mar 5, 2024·0 cites·5 claims
- 0867US2025291259A1Method of manufacturing semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0967US2025147409A1Method for manufacturing semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1066US6539528B2Methods, systems, and computer program products for designing an integrated circuit that use an information repository having circuit block layout informationSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Mar 25, 2003·12 cites·28 claims
- 1164US9465900B2System and method for designing semiconductor package using computing system, apparatus for fabricating semiconductor package including the system, and semiconductor package designed by the methodJEONG JAE-HOON·Filed 2013·Granted Oct 11, 2016·2 cites·29 claims
- 1260US2025244660A1Semiconductor device manufacturing methodSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1359US2025012736A1Method of optimizing overlay measurement condition and overlay measurement method using overlay measurement conditionSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1454US10444276B2Computing device executing program performing method of analyzing power noise in semiconductor device, semiconductor device design method, and program storage medium storing programSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Oct 15, 2019·0 cites·20 claims
- 1554US2024152046A1Method of controlling semiconductor process and semiconductor processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1653US2014254916A1Methods for measuring overlaysSAMSUNG ELECTRONICS CO LTD·Filed 2014·Application pending·0 cites
- 1753US2024258178A1Method of detecting overlay of patterns and method of forming patterns using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1852US2024152064A1Photolithography method and method of manufacturing a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1951US7799490B2Optical masks and methods for measuring aberration of a beamSAMSUNG ELECTRONICS CO LTD·Filed 2010·Granted Sep 21, 2010·0 cites·11 claims
- 2051US7670725B2Optical masks and methods for measuring aberration of a beamSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Mar 2, 2010·0 cites·18 claims
- 2151US2024133683A1Overlay measuring method and system, and method of manufacturing a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 2248US2024134290A1Multi-wavelength selection method for overlay measurement, and overlay measurement method and semiconductor device manufacturing method using multi-wavelengthsSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 2347US9958495B2Computing device executing program performing method of analyzing power noise in semiconductor device, semiconductor device design method, and program storage medium storing programSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted May 1, 2018·0 cites·11 claims
- 2447US2025285863A1Method of forming pattern and method of manufacturing semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 2546US9281250B2Method of detecting an asymmetric portion of an overlay mark and method of measuring an overlay including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Mar 8, 2016·0 cites·20 claims
- 2644US11456222B2Overlay correction method and semiconductor fabrication method including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Sep 27, 2022·0 cites·20 claims
- 2743US10198541B2Circuit modeling system and circuit modeling method based on net list simplification techniqueSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Feb 5, 2019·0 cites·20 claims
- 2841US2015294455A1Methods of testing pattern reliability and semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2014·Application pending·0 cites
- 2938US2011317163A1Method of Aligning a Wafer and Method of Monitoring a Lithography Process Including the SameLEE SEUNG-YOON·Filed 2011·Application pending·0 cites
- 3037US10119811B2Alignment mark, method of measuring wafer alignment, and method of manufacturing a semiconductor device using the method of measuring wafer alignmentSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Nov 6, 2018·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →