Inventor · disambiguated record
Victor Emanuel Calado
Also filed as: CALADO VICTOR EMANUEL
8 granted patents·4 pending applications·13 citations·filing 2016–2023
79Inventor score
Files withASML NETHERLANDS BV12
Top patents by PatentIndex Score
12 records- 0193US10474045B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Nov 12, 2019·6 cites·20 claims
- 0289US12276921B2Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology methodASML NETHERLANDS BV·Filed 2021·Granted Apr 15, 2025·2 cites·17 claims
- 0382US11187995B2Metrology using a plurality of metrology target measurement recipesASML NETHERLANDS BV·Filed 2017·Granted Nov 30, 2021·2 cites·20 claims
- 0481US10162272B2Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Dec 25, 2018·2 cites·23 claims
- 0576US10788761B2Determining an optimal operational parameter setting of a metrology systemASML NETHERLANDS BV·Filed 2017·Granted Sep 29, 2020·1 cites·20 claims
- 0669US11320750B2Determining an optimal operational parameter setting of a metrology systemASML NETHERLANDS BV·Filed 2020·Granted May 3, 2022·0 cites·20 claims
- 0760US2025348009A1Metrology method and associated metrology deviceASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 0852US2025336046A1System and method for distortion adjustment during inspectionASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 0946US10474043B2Method of measuring a property of a substrate, inspection apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Nov 12, 2019·0 cites·17 claims
- 1045US2020159128A1A device manufacturing method and a computer program productASML NETHERLANDS BV·Filed 2018·Application pending·0 cites
- 1142US11300887B2Method to change an etch parameterASML NETHERLANDS BV·Filed 2017·Granted Apr 12, 2022·0 cites·20 claims
- 1237US2019294059A1Method of determining pellicle compensation corrections for a lithographic process, metrology apparatus and computer programASML NETHERLANDS BV·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →