Inventor · disambiguated record
Yuri Erokhin
Also filed as: EROKHIN YURI
12 granted patents·5 pending applications·104 citations·filing 1998–2019
90Inventor score
Files withVARIAN SEMICONDUCTOR EQUIPMENT6IPG PHOTONICS CORP3IBIS TECHNOLOGY CORP2AXCELIS TECH INC1EROKHIN YURI1
Top patents by PatentIndex Score
17 records- 0192US9190498B2Technique for forming a FinFET device using selective ion implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Nov 17, 2015·15 cites·7 claims
- 0283US8598025B2Doping of planar or three-dimensional structures at elevated temperaturesSTEEN LOUIS·Filed 2011·Granted Dec 3, 2013·15 cites·17 claims
- 0376US9941120B2Process and system for uniformly crystallizing amorphous silicon substrate by fiber laserIPG PHOTONICS CORP·Filed 2015·Granted Apr 10, 2018·2 cites·13 claims
- 0474US8617955B2Method and system for forming low contact resistance deviceWAITE ANDREW·Filed 2011·Granted Dec 31, 2013·4 cites·7 claims
- 0569US7112509B2Method of producing a high resistivity SIMOX silicon substrateSEH AMERICA INC·Filed 2003·Granted Sep 26, 2006·16 cites·19 claims
- 0668US6255662B1Rutherford backscattering detection for use in Ion implantationAXCELIS TECH INC·Filed 1998·Granted Jul 3, 2001·27 cites·21 claims
- 0766US10409148B2RGB projector with multi-laser broadband light source and system for dynamically controlling image contrast ratioIPG PHOTONICS CORP·Filed 2017·Granted Sep 10, 2019·1 cites·8 claims
- 0865US6998353B2Active wafer cooling during damage engineering implant to enhance buried oxide formation in SIMOX wafersIBIS TECHNOLOGY CORP·Filed 2001·Granted Feb 14, 2006·13 cites·17 claims
- 0962US7820527B2Cleave initiation using varying ion implant doseVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted Oct 26, 2010·2 cites·19 claims
- 1061US7939424B2Wafer bonding activated by ion implantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted May 10, 2011·1 cites·14 claims
- 1159US7294561B2Internal gettering in SIMOX SOI silicon substratesIBIS TECHNOLOGY CORP·Filed 2003·Granted Nov 13, 2007·8 cites·27 claims
- 1258USRE48398EProcess and system for uniformly crystallizing amorphous silicon substrate by fiber laserIPG PHOTONICS CORP·Filed 2019·Granted Jan 19, 2021·0 cites·15 claims
- 1346US2009084988A1Single wafer implanter for silicon-on-insulator wafer fabricationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Application pending·0 cites
- 1445US2009084757A1Uniformity control for ion beam assisted etchingEROKHIN YURI·Filed 2007·Application pending·0 cites
- 1543US2007184194A1Technique for depositing metallic films using ion implantation surface modification for catalysis of electroless depositionVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Application pending·0 cites
- 1638US2009181492A1Nano-cleave a thin-film of silicon for solar cell fabricationNUNAN PETER·Filed 2008·Application pending·0 cites
- 1738US2006043531A1Reduction of source and drain parasitic capacitance in CMOS devicesVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →