Inventor · disambiguated record
Fumitake Kaneko
Also filed as: KANEKO FUMITAKE
27 granted patents·27 pending applications·333 citations·filing 1996–2012
97Inventor score
Top patents by PatentIndex Score
54 records- 0192US6811817B2Method for reducing pattern dimension in photoresist layerTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Nov 2, 2004·47 cites·4 claims
- 0290US6406829B1Negative-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Jun 18, 2002·44 cites·7 claims
- 0389US7741260B2Rinsing fluid for lithographyTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Jun 22, 2010·12 cites·4 claims
- 0487US8206891B2Positive resist composition and method of forming resist patternSESHIMO TAKEHIRO·Filed 2009·Granted Jun 26, 2012·10 cites·6 claims
- 0581US7553610B2Method of forming fine patternsTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Jun 30, 2009·6 cites·7 claims
- 0679US8124318B2Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2010·Granted Feb 28, 2012·2 cites·20 claims
- 0779US5939510AUndercoating composition for photolithographic resistTOKYO OHKA KOGYA CO LTD·Filed 1997·Granted Aug 17, 1999·38 cites·6 claims
- 0878US7189499B2Method of forming fine patternsTOKYO OHKA KOGYO CO LTD·Filed 2003·Granted Mar 13, 2007·15 cites·7 claims
- 0973US6455228B1Multilayered body for photolithographic patterningTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Sep 24, 2002·13 cites·6 claims
- 1068US7235345B2Agent for forming coating for narrowing patterns and method for forming fine pattern using the sameTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Jun 26, 2007·9 cites·6 claims
- 1167US7811748B2Resist pattern forming method and composite rinse agentTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Oct 12, 2010·2 cites·12 claims
- 1263US5700625ANegative-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Dec 23, 1997·22 cites·4 claims
- 1361US6042988AChemical-amplification-type negative resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Mar 28, 2000·20 cites·15 claims
- 1458US9040220B2Compound and method of producing the same, acid generator, resist composition and method of forming resist patternHADA HIDEO·Filed 2012·Granted May 26, 2015·0 cites·17 claims
- 1558US8187798B2Method of forming fine patternsSUGETA YOSHIKI·Filed 2009·Granted May 29, 2012·0 cites·6 claims
- 1658US5925495APhotoresist laminate and method for patterning using the sameTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jul 20, 1999·15 cites·5 claims
- 1757US8142980B2Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2009·Granted Mar 27, 2012·0 cites·13 claims
- 1857US2009041948A1Method of forming fine patternsSHINBORI HIROSHI·Filed 2008·Application pending·0 cites
- 1957US2010075263A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2009·Application pending·0 cites
- 2057US2009186156A1Method of forming fine patternsSUGETA YOSHIKI·Filed 2009·Application pending·0 cites
- 2156US2009148611A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2009·Application pending·0 cites
- 2256US2010139838A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2009·Application pending·0 cites
- 2355US6087068AUndercoating composition for photolithographic resistTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jul 11, 2000·13 cites·13 claims
- 2455US5976760AChemical-sensitization resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Nov 2, 1999·16 cites·13 claims
- 2555US2009011601A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2008·Application pending·0 cites
- 2655US2008145539A1Method of forming fine patternsSUGETA YOSHIKI·Filed 2008·Application pending·0 cites
- 2755US2009126855A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2009·Application pending·0 cites
- 2853US2006263728A1Method of forming fine patternsSHINBORI HIROSHI·Filed 2006·Application pending·0 cites
- 2952US6083665APhotoresist laminate and method for patterning using the sameTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jul 4, 2000·11 cites·1 claims
- 3052US2007213447A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2007·Application pending·0 cites
- 3151US2006258809A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2006·Application pending·0 cites
- 3250US2010272909A1Method of forming fine patternsSHINBORI HIROSHI·Filed 2010·Application pending·0 cites
- 3350US2006099347A1Method for reducing pattern dimension in photoresist layerSUGETA YOSHIKI·Filed 2005·Application pending·0 cites
- 3450US2006003601A1Method of forming fine patternsSUGETA YOSHIKI·Filed 2005·Application pending·0 cites
- 3549US2006079628A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2005·Application pending·0 cites
- 3648US2005245663A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentSUGETA YOSHIKI·Filed 2005·Application pending·0 cites
- 3747US9034556B2Compound and method of producing the same, acid generator, resist composition and method of forming resist patternHADA HIDEO·Filed 2008·Granted May 19, 2015·2 cites·11 claims
- 3847US6171749B1Negative-working chemical-amplification photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jan 9, 2001·12 cites·14 claims
- 3946US6245930B1Chemical-sensitization resist compositionTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Jun 12, 2001·9 cites·7 claims
- 4044US7033731B2Multilayered body for photolithographic patterningTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Apr 25, 2006·0 cites·7 claims
- 4144US2005058950A1Method for reducing pattern dimension in photoresist layerFiled 2004·Application pending·0 cites
- 4243US2005009365A1Method of forming fine patternsFiled 2003·Application pending·0 cites
- 4343US2005175926A1Coating forming agent for reducing pattern dimension and method of forming fine pattern therewithTOKYO OHKA KOGYO CO LTD·Filed 2003·Application pending·0 cites
- 4442US5789136ANegative-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Aug 4, 1998·9 cites·9 claims
- 4542US2004121615A1Method of forming fine patternsFiled 2003·Application pending·0 cites
- 4642US2004067303A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentFiled 2003·Application pending·0 cites
- 4742US2004137377A1Method for forming fine patternsSHINBORI HIROSHI·Filed 2002·Application pending·0 cites
- 4842US2004106737A1Over-coating agent for forming fine patterns and a method of forming fine patterns using such agentFiled 2003·Application pending·0 cites
- 4942US2003008968A1Method for reducing pattern dimension in photoresist layerFiled 2002·Application pending·0 cites
- 5040US2007141508A1Negative resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2005·Application pending·0 cites
Showing the top 50 of 54 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Fumitake Kaneko files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →