Inventor · disambiguated record
David Brzozowy
Also filed as: BRZOZOWY DAVID · BRZOZOWY DAVID J
5 granted patents·2 pending applications·69 citations·filing 1992–2003
81Inventor score
Top patents by PatentIndex Score
7 records- 0174US5346799ANovolak resins and their use in radiation-sensitive compositions wherein the novolak resins are made by condensing 2,6-dimethylphenol, 2,3-dimethylphenol, a para-substituted phenol and an aldehydeOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Sep 13, 1994·22 cites·8 claims
- 0273US5164286APhotoresist developer containing fluorinated amphoteric surfactantOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Nov 17, 1992·28 cites·12 claims
- 0358US6911297B2Photoresist compositionsARCH SPEC CHEM INC·Filed 2003·Granted Jun 28, 2005·7 cites·22 claims
- 0446US5284737AProcess of developing an image utilizing positive-working radiation sensitive mixtures containing alkali-soluble binder, o-quinonediazide photoactive compound and blankophor FBW actinic dyeOCG MICROELECTRONIC MATERIALS·Filed 1993·Granted Feb 8, 1994·8 cites·5 claims
- 0537US5275909APositive-working radiation sensitive mixtures and articles containing alkali-soluble binder, o-quinonediazide photoactive compound and BLANKOPHOR FBW acting dyeOCG MICROELECTRONIC MATERIALS·Filed 1992·Granted Jan 4, 1994·4 cites·9 claims
- 0633US2003064321A1Free-acid containing polymers and their use in photoresistsARCH SPEC CHEM INC·Filed 2002·Application pending·0 cites
- 0732US2003078354A1Novel beta-oxo compounds and their use in photoresistARCH SPEC CHEM INC·Filed 2002·Application pending·0 cites
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