Inventor · disambiguated record
Matthew Van Hanehem
Also filed as: VAN HANEHEM MATTHEW · VAN HANEHEM MATTHEW RICHARD
12 granted patents·3 pending applications·34 citations·filing 2013–2024
85Inventor score
Files withROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC12DOW GLOBAL TECHNOLOGIES LLC1DUPONT ELECTRONIC MAT HOLDING INC1ROHM & HAAS ELECT MAT1
Top patents by PatentIndex Score
15 records- 0194US9783702B1Aqueous compositions of low abrasive silica particlesROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Oct 10, 2017·16 cites·11 claims
- 0290US10626298B1Chemical mechanical polishing compositions and methods for suppressing the removal rate of amorphous siliconROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Granted Apr 21, 2020·5 cites·10 claims
- 0386US9102034B2Method of chemical mechanical polishing a substrateROHM & HAAS ELECT MAT·Filed 2013·Granted Aug 11, 2015·8 cites·11 claims
- 0481US10170335B1Chemical mechanical polishing method for cobaltROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Jan 1, 2019·3 cites·8 claims
- 0578US10787592B1Chemical mechanical polishing compositions and methods having enhanced defect inhibition and selectively polishing silicon nitride over silicon dioxide in an acid environmentROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Granted Sep 29, 2020·2 cites·8 claims
- 0667US2025387872A1Polishing pad with thermal management featuresDUPONT ELECTRONIC MAT HOLDING INC·Filed 2024·Application pending·0 cites
- 0753US10954411B2Chemical mechanical polishing composition and method of polishing silicon nitride over silicon dioxide and simultaneously inhibiting damage to silicon dioxideROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Granted Mar 23, 2021·0 cites·8 claims
- 0853US10584265B2Aqueous silica slurry and amine carboxylic acid compositions selective for nitride removal in polishing and methods of using themROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Mar 10, 2020·0 cites·5 claims
- 0949US2022348790A1Chemical mechanical polishing composition and methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2022·Application pending·0 cites
- 1046US11292938B2Method of selective chemical mechanical polishing cobalt, zirconium oxide, poly-silicon and silicon dioxide filmsROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Granted Apr 5, 2022·0 cites·11 claims
- 1146US10221336B2Aqueous silica slurry compositions for use in shallow trench isolation and methods of using themROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Mar 5, 2019·0 cites·10 claims
- 1246US2015065013A1Chemical mechanical polishing padDOW GLOBAL TECHNOLOGIES LLC·Filed 2013·Application pending·0 cites
- 1345US10316218B2Aqueous silica slurry compositions for use in shallow trench isolation and methods of using themROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Jun 11, 2019·0 cites·6 claims
- 1444US10822524B2Aqueous compositions of low dishing silica particles for polysilicon polishingROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Nov 3, 2020·0 cites·10 claims
- 1542US10377921B2Chemical mechanical polishing method for cobaltROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Aug 13, 2019·0 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →