Inventor · disambiguated record
Kazue Takahashi
Also filed as: TAKAHASHI KAZUE
59 granted patents·24 pending applications·1,883 citations·filing 1980–2019
99Inventor score
Top patents by PatentIndex Score
83 records- 0198US6755932B2Plasma processing system and apparatus and a sample processing methodHITACHI LTD·Filed 2001·Granted Jun 29, 2004·290 cites·11 claims
- 0296US6618692B2Remote diagnostic system and method for semiconductor manufacturing equipmentHITACHI LTD·Filed 2001·Granted Sep 9, 2003·140 cites·9 claims
- 0396US6503364B1Plasma processing apparatusHITACHI LTD·Filed 2000·Granted Jan 7, 2003·92 cites·7 claims
- 0495US6171438B1Plasma processing apparatus and plasma processing methodHITACHI LTD·Filed 1999·Granted Jan 9, 2001·100 cites·48 claims
- 0594US7158848B2Process monitoring device for sample processing apparatus and control method of sample processing apparatusHITACHI LTD·Filed 2006·Granted Jan 2, 2007·19 cites·2 claims
- 0694US6815365B2Plasma etching apparatus and plasma etching methodHITACHI LTD·Filed 2001·Granted Nov 9, 2004·44 cites·10 claims
- 0794US5536359ASemiconductor device manufacturing apparatus and method with optical monitoring of state of processing chamberHITACHI LTD·Filed 1994·Granted Jul 16, 1996·86 cites·26 claims
- 0893US7376479B2Process monitoring device for sample processing apparatus and control method of sample processing apparatusHITACHI LTD·Filed 2006·Granted May 20, 2008·15 cites·2 claims
- 0991US5895586APlasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminumHITACHI LTD·Filed 1995·Granted Apr 20, 1999·74 cites·5 claims
- 1090US6506686B2Plasma processing apparatus and plasma processing methodHITACHI LTD·Filed 2001·Granted Jan 14, 2003·52 cites·10 claims
- 1190US6048434ASubstrate holding system including an electrostatic chuckHITACHI LTD·Filed 1996·Granted Apr 11, 2000·68 cites·15 claims
- 1290US5874012APlasma processing apparatus and plasma processing methodHITACHI LTD·Filed 1996·Granted Feb 23, 1999·60 cites·31 claims
- 1388US5906684AMethod of holding substrate and substrate holding systemHITACHI LTD·Filed 1998·Granted May 25, 1999·54 cites·21 claims
- 1488US5442183ACharged particle beam apparatus including means for maintaining a vacuum sealHITACHI LTD·Filed 1993·Granted Aug 15, 1995·47 cites·9 claims
- 1587US6524428B2Method of holding substrate and substrate holding systemHITACHI LTD·Filed 2001·Granted Feb 25, 2003·24 cites·11 claims
- 1687US5792304AMethod of holding substrate and substrate holding systemHITACHI LTD·Filed 1994·Granted Aug 11, 1998·62 cites·14 claims
- 1786US6879867B2Process monitoring device for sample processing apparatus and control method of sample processing apparatusHITACHI LTD·Filed 2001·Granted Apr 12, 2005·25 cites·19 claims
- 1886US6759253B2Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring unitsHITACHI LTD·Filed 2001·Granted Jul 6, 2004·27 cites·33 claims
- 1986US6217705B1Method of holding substrate and substrate holding systemHITACHI LTD·Filed 2000·Granted Apr 17, 2001·26 cites·10 claims
- 2086US5556204AMethod and apparatus for detecting the temperature of a sampleHITACHI LTD·Filed 1994·Granted Sep 17, 1996·92 cites·4 claims
- 2185US5254856ACharged particle beam apparatus having particular electrostatic objective lens and vacuum pump systemsHITACHI LTD·Filed 1991·Granted Oct 19, 1993·43 cites·57 claims
- 2284US6645871B2Method of holding substrate and substrate holding systemHITACHI LTD·Filed 2001·Granted Nov 11, 2003·20 cites·5 claims
- 2382US5259735AEvacuation system and method thereforHITACHI LTD·Filed 1992·Granted Nov 9, 1993·45 cites·12 claims
- 2480US7608162B2Plasma processing apparatus and methodHITACHI LTD·Filed 2007·Granted Oct 27, 2009·4 cites·7 claims
- 2580US7058467B2Process monitoring device for sample processing apparatus and control method of sample processing apparatusHITACHI LTD·Filed 2004·Granted Jun 6, 2006·16 cites·2 claims
- 2677US6899789B2Method of holding substrate and substrate holding systemHITACHI LTD·Filed 2003·Granted May 31, 2005·11 cites·5 claims
- 2776US6759338B2Plasma processing apparatus and methodHITACHI LTD·Filed 2001·Granted Jul 6, 2004·9 cites·5 claims
- 2875US6923885B2Plasma processing system and apparatus and a sample processing methodHITACHI LTD·Filed 2003·Granted Aug 2, 2005·11 cites·19 claims
- 2974US11666664B2Self assembling molecules for targeted drug deliveryMASSACHUSETTS GEN HOSPITAL·Filed 2019·Granted Jun 6, 2023·0 cites·8 claims
- 3074US6676805B2Method of holding substrate and substrate holding systemHITACHI LTD·Filed 2002·Granted Jan 13, 2004·10 cites·12 claims
- 3172US6544379B2Method of holding substrate and substrate holding systemHITACHI LTD·Filed 2001·Granted Apr 8, 2003·9 cites·50 claims
- 3272US5781400AElectrostatically attracting electrode and a method of manufacture thereofHITACHI LTD·Filed 1996·Granted Jul 14, 1998·34 cites·9 claims
- 3371US7686917B2Plasma processing system and apparatus and a sample processing methodHITACHI LTD·Filed 2007·Granted Mar 30, 2010·2 cites·7 claims
- 3471US7565879B2Plasma processing apparatusHITACHI LTD·Filed 2004·Granted Jul 28, 2009·6 cites·4 claims
- 3570US6610170B2Method of holding substrate and substrate holding systemHITACHI LTD·Filed 2002·Granted Aug 26, 2003·8 cites·2 claims
- 3670US6537012B2Vacuum processing apparatus and a vacuum processing systemHITACHI LTD·Filed 2002·Granted Mar 25, 2003·11 cites·1 claims
- 3770US5961774AMethod of holding substrate and substrate holding systemHITACHI LTD·Filed 1997·Granted Oct 5, 1999·22 cites·6 claims
- 3869US7491868B2Mannose binding lectin knock-out mice and methods of use thereofGEN HOSPITAL CORP·Filed 2005·Granted Feb 17, 2009·3 cites·7 claims
- 3968US6649021B2Apparatus and method for plasma processing high-speed semiconductor circuits with increased yieldHITACHI LTD·Filed 2001·Granted Nov 18, 2003·9 cites·5 claims
- 4068US6336991B1Method of holding substrate and substrate holding systemHITACHI LTD·Filed 1998·Granted Jan 8, 2002·19 cites·10 claims
- 4166US6610171B2Method of holding substrate and substrate holding systemHITACHI LTD·Filed 2002·Granted Aug 26, 2003·6 cites·2 claims
- 4266US6221201B1Method of holding substrate and substrate holding systemHITACHI LTD·Filed 1998·Granted Apr 24, 2001·18 cites·2 claims
- 4365US7208422B2Plasma processing methodHITACHI LTD·Filed 2004·Granted Apr 24, 2007·4 cites·28 claims
- 4465US5985035AMethod of holding substrate and substrate holding systemHITACHI LTD·Filed 1998·Granted Nov 16, 1999·17 cites·1 claims
- 4564US6482747B1Plasma treatment method and plasma treatment apparatusHITACHI LTD·Filed 1998·Granted Nov 19, 2002·22 cites·19 claims
- 4663US6967109B2Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring unitsHITACHI LTD·Filed 2004·Granted Nov 22, 2005·6 cites·6 claims
- 4761US2009289035A1Plasma Processing Apparatus And Plasma Processing MethodKANAI SABURO·Filed 2009·Application pending·0 cites
- 4859US6186153B1Plasma treatment method and manufacturing method of semiconductor deviceHITACHI LTD·Filed 1998·Granted Feb 13, 2001·25 cites·16 claims
- 4958US6235146B1Vacuum treatment system and its stageHITACHI LTD·Filed 1999·Granted May 22, 2001·22 cites·14 claims
- 5058US4511269ACancel type printing headHITACHI LTD·Filed 1983·Granted Apr 16, 1985·11 cites·7 claims
Showing the top 50 of 83 patent records by PatentIndex Score.
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