Inventor · disambiguated record
Nobuhito Toyama
Also filed as: TOYAMA NOBUHITO
18 granted patents·1 pending application·150 citations·filing 2000–2019
92Inventor score
Top patents by PatentIndex Score
19 records- 0192US7297386B2Antireflection structureDAINIPPON PRINTING CO LTD·Filed 2003·Granted Nov 20, 2007·81 cites·21 claims
- 0279US10591133B2Diffractive optical element and light irradiation apparatusDAINIPPON PRINTING CO LTD·Filed 2019·Granted Mar 17, 2020·2 cites·11 claims
- 0375US11340389B2Diffractive optical elementDAINIPPON PRINTING CO LTD·Filed 2018·Granted May 24, 2022·2 cites·6 claims
- 0472US7117140B2Method of evaluating the exposure property of data to waferDAINIPPON PRINTING CO LTD·Filed 2002·Granted Oct 3, 2006·13 cites·4 claims
- 0570US7067221B2Designing method and device for phase shift maskDAINIPPON PRINTING CO LTD·Filed 2003·Granted Jun 27, 2006·12 cites·12 claims
- 0667US6821683B2Method for correcting design pattern of semiconductor circuit, a photomask fabricated using the corrected design pattern data, a method for inspecting the photomask and a method for generating pattern data for inspection of photomaskDAINIPPON PRINTING CO LTD·Filed 2001·Granted Nov 23, 2004·13 cites·10 claims
- 0765US8124301B2Gradated photomask and its fabrication processFUJIKAWA JUNJI·Filed 2006·Granted Feb 28, 2012·3 cites·10 claims
- 0865US7367010B2Designing method and device for phase shift maskDAINIPPON PRINTING CO LTD·Filed 2005·Granted Apr 29, 2008·2 cites·6 claims
- 0962US6523163B1Method for forming pattern data and method for writing a photomask with additional patternsDAINIPPON PRINTING CO LTD·Filed 2000·Granted Feb 18, 2003·7 cites·11 claims
- 1055US10704763B2Diffractive optical element and light irradiation apparatusDAINIPPON PRINTING CO LTD·Filed 2016·Granted Jul 7, 2020·0 cites·12 claims
- 1154US8259290B2Diffractive optical device, and aligner comprising that deviceTOYAMA NOBUHITO·Filed 2007·Granted Sep 4, 2012·1 cites·3 claims
- 1254US7287240B2Designing method and device for phase shift maskDAINIPPON PRINTING CO LTD·Filed 2002·Granted Oct 23, 2007·6 cites·20 claims
- 1352US6560767B2Process for making photomask pattern data and photomaskDAINIPPON PRINTING CO LTD·Filed 2001·Granted May 6, 2003·5 cites·3 claims
- 1451US11366256B2Diffractive optical elementDAINIPPON PRINTING CO LTD·Filed 2018·Granted Jun 21, 2022·0 cites·10 claims
- 1548US10768347B2Diffractive optical element and light irradiation deviceDAINIPPON PRINTING CO LTD·Filed 2017·Granted Sep 8, 2020·0 cites·18 claims
- 1647US6694500B2Design circuit pattern for test of semiconductor circuitDAINIPPON PRINTING CO LTD·Filed 2001·Granted Feb 17, 2004·2 cites·16 claims
- 1746US6656664B2Method of forming minute focusing lensDAINIPPON PRINTING CO LTD·Filed 2002·Granted Dec 2, 2003·1 cites·4 claims
- 1837US7968255B2PhotomaskDAINIPPON PRINTING CO LTD·Filed 2007·Granted Jun 28, 2011·0 cites·6 claims
- 1937US2004131949A1Phase mask for forming diffraction grating, method of fabricating phase mask, and method of forming diffraction gratingDAINIPPON PRINTING CO LTD·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →