Inventor · disambiguated record
Hin Yiu Anthony Chung
Also filed as: CHUNG HIN Y · CHUNG HIN YIU · CHUNG HIN YIU ANTHONY
13 granted patents·9 pending applications·35 citations·filing 2002–2020
88Inventor score
Files withZEISS CARL SMT GMBH7ZEISS CARL SMT AG3CHUNG HIN YIU ANTHONY2INFINEON TECHNOLOGIES AG2LEYBOLD GMBH2
Top patents by PatentIndex Score
22 records- 0187US10141174B2Method for examining a gas by mass spectrometry and mass spectrometerZEISS CARL SMT GMBH·Filed 2017·Granted Nov 27, 2018·8 cites·21 claims
- 0286US10903060B2Method for mass spectrometric examination of gas mixtures and mass spectrometer thereforLEYBOLD GMBH·Filed 2016·Granted Jan 26, 2021·2 cites·20 claims
- 0384US10304672B2Mass spectrometer, use thereof, and method for the mass spectrometric examination of a gas mixtureZEISS CARL SMT GMBH·Filed 2015·Granted May 28, 2019·5 cites·26 claims
- 0478US10236169B2Ionization device with mass spectrometer therewithZEISS CARL SMT GMBH·Filed 2017·Granted Mar 19, 2019·3 cites·20 claims
- 0578US8011319B2Method for oxidizing a layer, and associated holding devices for a substrateINFINEON TECHNOLOGIES AG·Filed 2009·Granted Sep 6, 2011·5 cites·7 claims
- 0675US9046794B2Cleaning module, EUV lithography device and method for the cleaning thereofHEMBACHER STEFAN·Filed 2010·Granted Jun 2, 2015·3 cites·40 claims
- 0772US8885141B2EUV lithography device and method for processing an optical elementSINGER WOLFGANG·Filed 2011·Granted Nov 11, 2014·2 cites·20 claims
- 0871US9176399B2Component of an EUV or UV lithography apparatus and method for producing itCHUNG HIN YIU ANTHONY·Filed 2012·Granted Nov 3, 2015·2 cites·16 claims
- 0961US2010007866A1Method for producing facet mirrors and projection exposure apparatusZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 1055US11875985B2Mass spectrometer comprising an ionization deviceLEYBOLD GMBH·Filed 2020·Granted Jan 16, 2024·0 cites·13 claims
- 1155US2010071720A1Method and system for removing contaminants from a surfaceZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 1254US7615499B2Method for oxidizing a layer, and associated holding devices for a substrateINFINEON TECHNOLOGIES AG·Filed 2003·Granted Nov 10, 2009·4 cites·16 claims
- 1354US2014299577A1Apparatus and method for surface processing of a substrateZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 1452US9459538B2Lithography apparatus and method for producing a mirror arrangementZEISS CARL SMT GMBH·Filed 2014·Granted Oct 4, 2016·0 cites·26 claims
- 1551US2013100426A1Method for producing facet mirrors and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2012·Application pending·0 cites
- 1647US2015235829A1Method for mass spectrometric examination of gas mixtures and mass spectrometer thereforZEISS CARL SMT GMBH·Filed 2015·Application pending·0 cites
- 1745US2011058147A1Cleaning module and euv lithography device with cleaning moduleZEISS CARL SMT AG·Filed 2010·Application pending·0 cites
- 1844US7144747B2Method for thermally treating a substrate that comprises several layersMATTSON THERMAL PRODUCTS GMBH·Filed 2002·Granted Dec 5, 2006·1 cites·16 claims
- 1936US8927090B2Method for bonding bodies and composite bodyCHUNG HIN YIU ANTHONY·Filed 2011·Granted Jan 6, 2015·0 cites·11 claims
- 2035US2006245906A1Device for accommodating disk-shaped objects and apparatus for handling objectsPELZMANN ARTHUR·Filed 2006·Application pending·0 cites
- 2134US2012086925A1Method for avoiding contamination and euv-lithography-systemKRAUS DIETER·Filed 2011·Application pending·0 cites
- 2230US2004126213A1Device for accommodating disk-shaped objects and apparatus for handling objectsFiled 2002·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Hin Yiu Anthony Chung files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →