Inventor · disambiguated record
Ikuo Hikima
Also filed as: HIKIMA IKUO
8 granted patents·3 pending applications·92 citations·filing 1988–2018
87Inventor score
Top patents by PatentIndex Score
11 records- 0189US8305552B2Exposure apparatus, exposure method, and method for producing deviceNISHINAGA HISASHI·Filed 2006·Granted Nov 6, 2012·10 cites·20 claims
- 0289US4820899ALaser beam working systemNIKON CORP·Filed 1988·Granted Apr 11, 1989·51 cites·9 claims
- 0383US8139198B2Exposure apparatus, exposure method, and method for producing deviceNISHINAGA HISASHI·Filed 2006·Granted Mar 20, 2012·5 cites·12 claims
- 0482US7924416B2Measurement apparatus, exposure apparatus, and device manufacturing methodNIKON CORP·Filed 2006·Granted Apr 12, 2011·7 cites·5 claims
- 0580US10025194B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2016·Granted Jul 17, 2018·1 cites·15 claims
- 0676US9513558B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2014·Granted Dec 6, 2016·1 cites·38 claims
- 0776US8749759B2Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2012·Granted Jun 10, 2014·1 cites·30 claims
- 0865US2018348643A1Exposure apparatus, exposure method, and method for producing deviceNIKON CORP·Filed 2018·Application pending·0 cites
- 0963US4952945AExposure apparatus using excimer laser sourceNIKON CORP·Filed 1988·Granted Aug 28, 1990·16 cites·11 claims
- 1048US2006238749A1Flare measuring method and flare measuring apparatus, exposure method and exposure apparatus, and exposure apparatus adjusting methodNIKON CORP·Filed 2006·Application pending·0 cites
- 1137US2004021854A1Flare measuring method and flare measuring device, exposure method and exposure system, method of adjusting exposure systemFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →