Inventor · disambiguated record
Akihiko Isao
Also filed as: ISAO AKIHIKO
18 granted patents·679 citations·filing 1982–2006
96Inventor score
Files withULVAC COATING CORP10ULVAC SEIMAKU4RENESAS TECH CORP2MITSUBISHI ELECTRIC CORP1ULCOAT ULVAC COATING CORP1
Top patents by PatentIndex Score
18 records- 0196US5474864APhase shift mask and manufacturing method thereof and exposure method using phase shift maskULVAC COATING CORP·Filed 1993·Granted Dec 12, 1995·99 cites·8 claims
- 0293US4416217AApparatus for forming an inhomogeneous optical layerULVAC SEIMAKU·Filed 1982·Granted Nov 22, 1983·93 cites·2 claims
- 0384US6569577B1Phase-shift photo mask blank, phase-shift photo mask and method for fabricating semiconductor devicesULVAC COATING CORP·Filed 2000·Granted May 27, 2003·40 cites·17 claims
- 0484US5605776APhase-shifting photomask blank, phase-shifting photomask, and method of manufacturing themULVAC COATING CORP·Filed 1995·Granted Feb 25, 1997·58 cites·28 claims
- 0584US5482799APhase shift mask and manufacturing method thereofMITSUBISHI ELECTRIC CORP·Filed 1994·Granted Jan 9, 1996·87 cites·7 claims
- 0683US5952128APhase-shifting photomask blank and method of manufacturing the same as well as phase-shifting photomaskULVAC COATING CORP·Filed 1996·Granted Sep 14, 1999·48 cites·5 claims
- 0782US5830607APhase shift mask and manufacturing method thereof and exposure method using phase shift maskULVAC COATING CORP·Filed 1997·Granted Nov 3, 1998·46 cites·3 claims
- 0882US5691090APhase shift mask and manufacturing method thereof and exposure method using phase shift maskULVAC COATING CORP·Filed 1996·Granted Nov 25, 1997·38 cites·27 claims
- 0981US5629114APhase shift mask and manufacturing method thereof and exposure method using phase shift mask comprising a semitransparent regionULVAC COATING CORP·Filed 1995·Granted May 13, 1997·37 cites·19 claims
- 1077US6689515B2Phase-shifting photomask blank, phase-shifting photomask, method for producing them and apparatus for manufacturing the blankULVAC COATING CORP·Filed 2001·Granted Feb 10, 2004·13 cites·2 claims
- 1176US5674647APhase shift mask and manufacturing method thereof and exposure method using phase shift maskULVAC COATING CORP·Filed 1995·Granted Oct 7, 1997·33 cites·59 claims
- 1274US5938897AMethod of manufacturing phase-shifting photomask blankULCOAT ULVAC COATING CORP·Filed 1997·Granted Aug 17, 1999·35 cites·4 claims
- 1361US7282308B2Phase shifter film and process for the sameRENESAS TECH CORP·Filed 2006·Granted Oct 16, 2007·0 cites·3 claims
- 1461US6228541B1Phase-shifting photomask blank, phase-shifting photomask, method for producing them and apparatus for manufacturing the blankULVAC COATING CORP·Filed 1999·Granted May 8, 2001·19 cites·20 claims
- 1558US4428980AMethod for forming an inhomogeneous optical layerULVAC SEIMAKU·Filed 1983·Granted Jan 31, 1984·13 cites·2 claims
- 1655US7090947B2Phase shifter film and process for the sameRENESAS TECH CORP·Filed 2001·Granted Aug 15, 2006·3 cites·54 claims
- 1750US4428979AMethod for forming an inhomogeneous optical layerULVAC SEIMAKU·Filed 1983·Granted Jan 31, 1984·9 cites·4 claims
- 1846US4416216AApparatus for forming an inhomogeneous optical layerULVAC SEIMAKU·Filed 1982·Granted Nov 22, 1983·8 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →