Inventor · disambiguated record
Teis Johan Coenen
Also filed as: COENEN TEIS JOHAN
11 granted patents·3 pending applications·14 citations·filing 2014–2023
83Inventor score
Files withASML NETHERLANDS BV14
Top patents by PatentIndex Score
14 records- 0188US12140875B2Metrology measurement method and apparatusASML NETHERLANDS BV·Filed 2021·Granted Nov 12, 2024·2 cites·15 claims
- 0284US9853412B2Radiation sourceASML NETHERLANDS BV·Filed 2015·Granted Dec 26, 2017·4 cites·19 claims
- 0378US9728931B2Electron injector and free electron laserASML NETHERLANDS BV·Filed 2014·Granted Aug 8, 2017·5 cites·43 claims
- 0473US10996568B2Methods and apparatus for metrologyASML NETHERLANDS BV·Filed 2019·Granted May 4, 2021·1 cites·16 claims
- 0573US10670974B2Metrology apparatus for and a method of determining a characteristic of interest of a structure on a substrateASML NETHERLANDS BV·Filed 2018·Granted Jun 2, 2020·1 cites·16 claims
- 0669US11996267B2Particle beam apparatus, defect repair method, lithographic exposure process and lithographic systemASML NETHERLANDS BV·Filed 2019·Granted May 28, 2024·1 cites·20 claims
- 0757US12399428B2Method and apparatus for forming a patterned layer of materialASML NETHERLANDS BV·Filed 2021·Granted Aug 26, 2025·0 cites·20 claims
- 0855US10103508B2Electron injector and free electron laserASML NETHERLANDS BV·Filed 2017·Granted Oct 16, 2018·0 cites·20 claims
- 0955US2025172878A1Apparatus and methods for filtering measurement radiationASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1054US10725387B2Determining an edge roughness parameter of a periodic structureASML NETHERLANDS BV·Filed 2018·Granted Jul 28, 2020·0 cites·20 claims
- 1154US2025306475A1Method for parameter reconstruction of a metrology device and associated metrology deviceASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1252US11353796B2Method and apparatus for determining a radiation beam intensity profileASML NETHERLANDS BV·Filed 2019·Granted Jun 7, 2022·0 cites·17 claims
- 1348US2023040124A1Method for correcting measurements in the manufacture of integrated circuits and associated apparatusesASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 1447US12325911B2Method and apparatus for forming a patterned layer of materialASML NETHERLANDS BV·Filed 2020·Granted Jun 10, 2025·0 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →