Inventor · disambiguated record
Erik Willem Bogaart
Also filed as: BOGAART ERIK WILLEM
12 granted patents·1 pending application·44 citations·filing 2012–2023
88Inventor score
Top patents by PatentIndex Score
13 records- 0197US9778025B2Method and apparatus for measuring asymmetry of a microstructure, position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Oct 3, 2017·21 cites·25 claims
- 0294US10558129B2Mask assemblyASML NETHERLANDS BV·Filed 2015·Granted Feb 11, 2020·7 cites·44 claims
- 0390US8570492B2Lithographic apparatusVAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS·Filed 2012·Granted Oct 29, 2013·6 cites·20 claims
- 0489US9696638B2Lithographic apparatusASML NETHERLANDS BV·Filed 2015·Granted Jul 4, 2017·3 cites·18 claims
- 0587US10585363B2Alignment systemASML NETHERLANDS BV·Filed 2016·Granted Mar 10, 2020·4 cites·15 claims
- 0683US9983485B2Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program productASML NETHERLANDS BV·Filed 2015·Granted May 29, 2018·2 cites·20 claims
- 0771US11169447B2Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program productASML NETHERLANDS BV·Filed 2020·Granted Nov 9, 2021·0 cites·20 claims
- 0870US9835954B2Inspection method and apparatus, substrates for use therein and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Dec 5, 2017·1 cites·17 claims
- 0968US11009803B2Mask assemblyASML NETHERLANDS BV·Filed 2019·Granted May 18, 2021·0 cites·18 claims
- 1062US10754258B2Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program productASML NETHERLANDS BV·Filed 2018·Granted Aug 25, 2020·0 cites·20 claims
- 1160US9229340B2Lithographic apparatusASML NETHERLANDS BV·Filed 2013·Granted Jan 5, 2016·0 cites·20 claims
- 1259US2025068085A1Substrate table, lithographic apparatus, sticker, cover ring and method of operating a lithographic apparatusASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1342US10042260B2Device for monitoring a radiation source, radiation source, method of monitoring a radiation source, device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Aug 7, 2018·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →