Inventor · disambiguated record
Seunghune Yang
Also filed as: YANG SEUNGHUNE
11 granted patents·7 pending applications·3 citations·filing 2014–2024
79Inventor score
Files withSAMSUNG ELECTRONICS CO LTD18
Top patents by PatentIndex Score
18 records- 0181US11900043B2Electronic device for manufacturing semiconductor device and operating method of electronic deviceSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Feb 13, 2024·1 cites·20 claims
- 0270US12237265B2Methods of manufacturing semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2023·Granted Feb 25, 2025·0 cites·20 claims
- 0367US9672611B2Pattern analysis method of a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Jun 6, 2017·2 cites·18 claims
- 0467US2025138434A1Method of configuring extreme ultra-violet (euv) illumination system, and euv exposure method using the euv illumination systemSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0565US2025224664A1Device for optimizing source mask and lithography system including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0663US11688687B2Semiconductor devices having landing pad patterns and methods of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Jun 27, 2023·0 cites·17 claims
- 0763US2025264794A1Optical proximity correction method, mask manufacturing method and semiconductor chip manufacturing method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0857US12326711B2Method and computing device for manufacturing semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Jun 10, 2025·0 cites·20 claims
- 0957US2023194979A1Method of correcting an error of a layout of a pattern, method of manufacturing a photomask using the same, and method of forming a pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 1057US2023161937A1Mask layout design method, mask and integrated circuit manufacturing methods, masks and integrated circuitsSAMSUNG ELECTRONICS CO LTD·Filed 2022·Application pending·0 cites
- 1154US2025224665A1Method of extracting sub-resolution assist feature (sraf) printing contours from scanning electron microscope (sem) image, optical proximity correction (opc) method, and mask manufacturing method including the opc methodSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1254US2025138431A1Method of configuring extreme ultra-violet (euv) light source and euv exposure method using the euv light sourceSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1352US12086526B2Methods and devices of correcting layout for semiconductor processes using machine learningSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Sep 10, 2024·0 cites·18 claims
- 1451US12476073B2Scanning electron microscope image-based pitch walk inspection method and method of manufacturing semiconductor device comprising the inspection methodSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Nov 18, 2025·0 cites·20 claims
- 1549US11506983B2Method of designing mask layout based on error pattern and method of manufacturing maskSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Nov 22, 2022·0 cites·20 claims
- 1647US9476840B2Methods of inspecting a semiconductor device and semiconductor inspection systemsSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Oct 25, 2016·0 cites·20 claims
- 1742US12044961B2Method of forming mask including curvilinear shape and method of forming semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Jul 23, 2024·0 cites·19 claims
- 1834US9965851B2Method for inspecting pattern and an apparatus for manufacturing a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted May 8, 2018·0 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →