Inventor · disambiguated record
Seongjun Jeong
Also filed as: JEONG SEONGJUN
13 granted patents·1 pending application·21 citations·filing 2015–2021
87Inventor score
Files withSAMSUNG ELECTRONICS CO LTD14
Top patents by PatentIndex Score
14 records- 0190US10996556B2Pellicles for photomasks, reticles including the photomasks, and methods of manufacturing the pelliclesSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted May 4, 2021·3 cites·27 claims
- 0284US10928723B2Pellicle for photomask, reticle including the same, and exposure apparatus for lithographySAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Feb 23, 2021·2 cites·34 claims
- 0384US10551735B2Pellicle composition for photomask, pellicle for photomask formed from the pellicle composition, method of forming the pellicle, reticle including the pellicle, and exposure apparatus for lithography including the reticleSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Feb 4, 2020·2 cites·29 claims
- 0484US9882074B2Optoelectronic deviceSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Jan 30, 2018·6 cites·20 claims
- 0582US10424490B2Hardmask composition, method of forming pattern using the hardmask composition, and hardmask formed from the hardmask compositionSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Sep 24, 2019·3 cites·26 claims
- 0679US10808142B2Method of preparing graphene quantum dot, hardmask composition including the graphene quantum dot obtained by the method, method of forming patterns using the hardmask composition, and hardmask formed from the hardmask compositionSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Oct 20, 2020·2 cites·19 claims
- 0773US11703753B2Pellicles for photomasks, reticles including the photomasks, and methods of manufacturing the pelliclesSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Jul 18, 2023·0 cites·31 claims
- 0872US10777412B2Hardmask composition, method of preparing the same, and method of forming patterned layer by using the hardmask compositionSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Sep 15, 2020·1 cites·27 claims
- 0972US9929238B2Graphene-containing device having graphene nanopatterns separated by narrow dead zone distanceSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Mar 27, 2018·1 cites·16 claims
- 1069US9748108B2Method of forming graphene nanopattern by using mask formed from block copolymerSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Aug 29, 2017·1 cites·27 claims
- 1154US10138543B2Method of analyzing growth of two-dimensional materialSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Nov 27, 2018·0 cites·11 claims
- 1242US10312100B2Conductor including nano-patterned substrate and method of manufacturing the conductorSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Jun 4, 2019·0 cites·15 claims
- 1340US11034847B2Hardmask composition, method of forming pattern using hardmask composition, and hardmask formed from hardmask compositionSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Jun 15, 2021·0 cites·23 claims
- 1437US2018061734A1Heat dissipation structure using graphene quantum dots and method of manufacturing the heat dissipation structureSAMSUNG ELECTRONICS CO LTD·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →