Inventor · disambiguated record
David Deckers
Also filed as: DECKERS DAVID · DECKERS DAVID FRANS SIMON
22 granted patents·4 pending applications·66 citations·filing 2011–2025
93Inventor score
Files withASML NETHERLANDS BV22DECKERS DAVID2ASML NETHERLANDS N V1BIJNEN FRANCISCUS GODEFRIDUS CASPER1
Top patents by PatentIndex Score
26 records- 0197US11940740B2Methods and apparatus for obtaining diagnostic information relating to an industrial processASML NETHERLANDS BV·Filed 2022·Granted Mar 26, 2024·2 cites·20 claims
- 0297US10642162B2Methods and apparatus for obtaining diagnostic information relating to an industrial processASML NETHERLANDS BV·Filed 2019·Granted May 5, 2020·8 cites·23 claims
- 0397US9946165B2Methods and apparatus for obtaining diagnostic information relating to an industrial processASML NETHERLANDS BV·Filed 2014·Granted Apr 17, 2018·19 cites·20 claims
- 0496US10274834B2Methods and apparatus for obtaining diagnostic information relating to an industrial processASML NETHERLANDS BV·Filed 2018·Granted Apr 30, 2019·15 cites·20 claims
- 0587US12287584B2Methods and apparatus for obtaining diagnostic information relating to an industrial processASML NETHERLANDS BV·Filed 2023·Granted Apr 29, 2025·0 cites·20 claims
- 0687US9046385B2Alignment measurement system, lithographic apparatus, and a method to determine alignment in a lithographic apparatusBIJNEN FRANCISCUS GODEFRIDUS CASPER·Filed 2011·Granted Jun 2, 2015·5 cites·13 claims
- 0785US2025264813A1Methods and apparatus for obtaining diagnostic information relating to an industrial processASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 0883US10996573B2Method and system for increasing accuracy of pattern positioningASML NETHERLANDS BV·Filed 2017·Granted May 4, 2021·2 cites·20 claims
- 0981US11782349B2Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2023·Granted Oct 10, 2023·0 cites·20 claims
- 1080US11054813B2Method and apparatus for controlling an industrial process using product groupingASML NETHERLANDS BV·Filed 2016·Granted Jul 6, 2021·2 cites·20 claims
- 1179US8982347B2Alignment mark deformation estimating method, substrate position predicting method, alignment system and lithographic apparatusASML NETHERLANDS N V·Filed 2012·Granted Mar 17, 2015·8 cites·17 claims
- 1277US11592753B2Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2022·Granted Feb 28, 2023·0 cites·20 claims
- 1377US10877381B2Methods of determining corrections for a patterning processASML NETHERLANDS BV·Filed 2017·Granted Dec 29, 2020·1 cites·20 claims
- 1477US10191390B2Method for transferring a mark pattern to a substrate, a calibration method, and a lithographic apparatusASML NETHERLANDS BV·Filed 2016·Granted Jan 29, 2019·2 cites·20 claims
- 1574US11385550B2Methods and apparatus for obtaining diagnostic information relating to an industrial processASML NETHERLANDS BV·Filed 2020·Granted Jul 12, 2022·0 cites·20 claims
- 1672US11327407B2Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2020·Granted May 10, 2022·0 cites·20 claims
- 1766US9927717B2Inspection method and apparatus, and lithographic apparatusASML NETHERLANDS BV·Filed 2014·Granted Mar 27, 2018·1 cites·20 claims
- 1861US10151987B2Measuring method, apparatus and substrateDECKERS DAVID·Filed 2011·Granted Dec 11, 2018·1 cites·20 claims
- 1960US12366809B2Methods and apparatus for controlling a lithographic processASML NETHERLANDS BV·Filed 2019·Granted Jul 22, 2025·0 cites·20 claims
- 2056US11754931B2Method for determining corrections for lithographic apparatusASML NETHERLANDS BV·Filed 2020·Granted Sep 12, 2023·0 cites·20 claims
- 2155US2023333485A1Target structure and associated methods and apparatusASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 2253US9280057B2Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatusASML NETHERLANDS BV·Filed 2015·Granted Mar 8, 2016·0 cites·16 claims
- 2353US2024152059A1A method for modeling measurement data over a substrate area and associated apparatusesASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2444US10915689B2Method and apparatus to correct for patterning process errorASML NETHERLANDS BV·Filed 2016·Granted Feb 9, 2021·0 cites·21 claims
- 2540US2011273685A1Production of an alignment markASML NETHERLANDS BV·Filed 2011·Application pending·0 cites
- 2631US9025148B2Alignment mark, substrate, set of patterning devices, and device manufacturing methodDECKERS DAVID·Filed 2011·Granted May 5, 2015·0 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →