Inventor · disambiguated record
Peter J. Maroulis
Also filed as: MAROULIS PETER J · MAROULIS PETER JAMES
10 granted patents·4 pending applications·236 citations·filing 1986–2008
91Inventor score
Top patents by PatentIndex Score
14 records- 0192US6686594B2On-line UV-Visible light halogen gas analyzer for semiconductor processing effluent monitoringAIR PROD & CHEM·Filed 2001·Granted Feb 3, 2004·53 cites·43 claims
- 0290US7581549B2Method for removing carbon-containing residues from a substrateAIR PROD & CHEM·Filed 2005·Granted Sep 1, 2009·18 cites·20 claims
- 0378US7485580B2Method for removing organic electroluminescent residues from a substrateAIR PROD & CHEM·Filed 2006·Granted Feb 3, 2009·6 cites·22 claims
- 0473US5661225ADynamic dilution systemAIR PROD & CHEM·Filed 1996·Granted Aug 26, 1997·46 cites·10 claims
- 0573US4747854ASelective chromatographic process using an ion-exchanged, dehydrated chabazite adsorbentAIR PROD & CHEM·Filed 1987·Granted May 31, 1988·26 cites·6 claims
- 0666US4744805ASelective adsorption process using an oxidized ion-exchanged dehydrated chabizite adsorbentAIR PROD & CHEM·Filed 1987·Granted May 17, 1988·20 cites·12 claims
- 0757US2010180913A1Methods for in-situ chamber cleaning process for high volume manufacture of semiconductor materialsARENA CHANTAL·Filed 2008·Application pending·0 cites
- 0854US5360467AMethod of separating and detecting impurities using a fractional concentration detectorAIR PROD & CHEM·Filed 1993·Granted Nov 1, 1994·18 cites·16 claims
- 0954US5034193AAutomated preparative gas chromatographAIR PROD & CHEM·Filed 1988·Granted Jul 23, 1991·20 cites·9 claims
- 1051US5006315AAutomated preparative gas chromatographAIR PROD & CHEM·Filed 1990·Granted Apr 9, 1991·19 cites·3 claims
- 1149US4713362ASelective zeolitic adsorbent and a method for activation thereofAIR PROD & CHEM·Filed 1986·Granted Dec 15, 1987·10 cites·26 claims
- 1242US2007261559A1Analysis of a reactive gas such as silane for particle generating impuritiesMAROULIS PETER J·Filed 2006·Application pending·0 cites
- 1339US2008142046A1Thermal F2 etch process for cleaning CVD chambersJOHNSON ANDREW DAVID·Filed 2006·Application pending·0 cites
- 1439US2005252529A1Low temperature CVD chamber cleaning using dilute NF3RIDGEWAY ROBERT G·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →