Inventor · disambiguated record
Shankar Muthukrishnan
Also filed as: MUTHUKRISHNAN SHANKAR
6 granted patents·8 pending applications·76 citations·filing 2004–2025
80Inventor score
Top patents by PatentIndex Score
14 records- 0195US7794544B2Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD systemAPPLIED MATERIALS INC·Filed 2007·Granted Sep 14, 2010·49 cites·14 claims
- 0284US12080573B2Temperature offset and zone control tuningAPPLIED MATERIALS INC·Filed 2020·Granted Sep 3, 2024·2 cites·19 claims
- 0375US8323754B2Stabilization of high-k dielectric materialsOLSEN CHRISTOPHER·Filed 2004·Granted Dec 4, 2012·23 cites·6 claims
- 0472US9263265B2Crystallization of amorphous films and grain growth using combination of laser and rapid thermal annealingAPPLIED MATERIALS INC·Filed 2014·Granted Feb 16, 2016·2 cites·20 claims
- 0571US2025105035A1Temperature offset and zone control tuningAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0659US10504779B2Hydrogenation and nitridization processes for reducing oxygen content in a filmAPPLIED MATERIALS INC·Filed 2019·Granted Dec 10, 2019·0 cites·20 claims
- 0756US2005252449A1Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD systemNGUYEN SON T·Filed 2005·Application pending·0 cites
- 0851US10236207B2Hydrogenation and nitridization processes for reducing oxygen content in a filmAPPLIED MATERIALS INC·Filed 2017·Granted Mar 19, 2019·0 cites·20 claims
- 0950US2006153995A1Method for fabricating a dielectric stackAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 1049US2025266296A1Integrated methods of manufacturing logic devices and memory devicesAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1148US2006062917A1Vapor deposition of hafnium silicate materials with tris(dimethylamino)silaneMUTHUKRISHNAN SHANKAR·Filed 2005·Application pending·0 cites
- 1240US2007049043A1Nitrogen profile engineering in HI-K nitridation for device performance enhancement and reliability improvementAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 1340US2006019033A1Plasma treatment of hafnium-containing materialsAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 1439US2015311067A1Millisecond annealing in ammonia ambient for precise placement of nitrogen in thin film stacksAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
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