Inventor · disambiguated record
Alex Paterson
Also filed as: PATERSON ALEX · PATERSON ALEX M
107 granted patents·13 pending applications·1,098 citations·filing 1999–2025
99Inventor score
Top patents by PatentIndex Score
120 records- 0198US10264663B1Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2017·Granted Apr 16, 2019·29 cites·46 claims
- 0298US9761459B2Systems and methods for reverse pulsingLAM RES CORP·Filed 2015·Granted Sep 12, 2017·93 cites·17 claims
- 0398US9583357B1Systems and methods for reverse pulsingLAM RES CORP·Filed 2016·Granted Feb 28, 2017·98 cites·18 claims
- 0498US9515633B1Transformer coupled capacitive tuning circuit with fast impedance switching for plasma etch chambersLAM RES CORP·Filed 2016·Granted Dec 6, 2016·60 cites·13 claims
- 0598US9017526B2Ion beam etching systemLAM RES CORP·Filed 2013·Granted Apr 28, 2015·48 cites·19 claims
- 0697US11716805B2Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2021·Granted Aug 1, 2023·4 cites·20 claims
- 0797US10197908B2Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling frameworkLAM RES CORP·Filed 2016·Granted Feb 5, 2019·27 cites·32 claims
- 0897US10062599B2Automated replacement of consumable parts using interfacing chambersLAM RES CORP·Filed 2016·Granted Aug 28, 2018·30 cites·24 claims
- 0997US9881820B2Front opening ring podLAM RES CORP·Filed 2016·Granted Jan 30, 2018·124 cites·29 claims
- 1097US9257295B2Ion beam etching systemLAM RES CORP·Filed 2015·Granted Feb 9, 2016·20 cites·20 claims
- 1197US9059678B2TCCT match circuit for plasma etch chambersLAM RES CORP·Filed 2013·Granted Jun 16, 2015·29 cites·12 claims
- 1296US11224116B2Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2020·Granted Jan 11, 2022·4 cites·19 claims
- 1396US10784083B2RF voltage sensor incorporating multiple voltage dividers for detecting RF voltages at a pickup device of a substrate supportLAM RES CORP·Filed 2018·Granted Sep 22, 2020·8 cites·20 claims
- 1496US10638593B2Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2019·Granted Apr 28, 2020·10 cites·20 claims
- 1596US10124492B2Automated replacement of consumable parts using end effectors interfacing with plasma processing systemLAM RES CORP·Filed 2016·Granted Nov 13, 2018·25 cites·26 claims
- 1696US10062589B2Front opening ring podLAM RES CORP·Filed 2017·Granted Aug 28, 2018·20 cites·19 claims
- 1796US10062590B2Front opening ring podLAM RES CORP·Filed 2017·Granted Aug 28, 2018·23 cites·19 claims
- 1896US9996647B2Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimizationLAM RES CORP·Filed 2017·Granted Jun 12, 2018·12 cites·31 claims
- 1996US9792393B2Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimizationLAM RES CORP·Filed 2016·Granted Oct 17, 2017·19 cites·34 claims
- 2096US9245761B2Internal plasma grid for semiconductor fabricationLAM RES CORP·Filed 2013·Granted Jan 26, 2016·21 cites·19 claims
- 2196US9099398B2Gas distribution showerhead for inductively coupled plasma etch reactorLAM RES CORP·Filed 2013·Granted Aug 4, 2015·41 cites·15 claims
- 2295US10121641B2Large dynamic range RF voltage sensor and method for voltage mode RF bias application of plasma processing systemsLAM RES CORP·Filed 2015·Granted Nov 6, 2018·8 cites·20 claims
- 2394US10585347B2Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling frameworkLAM RES CORP·Filed 2018·Granted Mar 10, 2020·9 cites·21 claims
- 2494US10224183B1Multi-level parameter and frequency pulsing with a low angular spreadLAM RES CORP·Filed 2018·Granted Mar 5, 2019·12 cites·30 claims
- 2594US10141163B2Controlling ion energy within a plasma chamberLAM RES CORP·Filed 2016·Granted Nov 27, 2018·8 cites·20 claims
- 2694US8562785B2Gas distribution showerhead for inductively coupled plasma etch reactorKANG MICHAEL·Filed 2011·Granted Oct 22, 2013·20 cites·15 claims
- 2793US11728136B2RF pulsing within pulsing for semiconductor RF plasma processingLAM RES CORP·Filed 2022·Granted Aug 15, 2023·2 cites·20 claims
- 2893US10573494B2Multi-level parameter and frequency pulsing with a low angular spreadLAM RES CORP·Filed 2019·Granted Feb 25, 2020·8 cites·20 claims
- 2993US10303830B2Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimizationLAM RES CORP·Filed 2018·Granted May 28, 2019·9 cites·29 claims
- 3093US10224221B2Internal plasma grid for semiconductor fabricationLAM RES CORP·Filed 2016·Granted Mar 5, 2019·7 cites·20 claims
- 3193US9460894B2Controlling ion energy within a plasma chamberLAM RES CORP·Filed 2013·Granted Oct 4, 2016·11 cites·20 claims
- 3292US7837838B2Method of fabricating a high dielectric constant transistor gate using a low energy plasma apparatusAPPLIED MATERIALS INC·Filed 2006·Granted Nov 23, 2010·20 cites·27 claims
- 3392US2025391638A1Rf pulsing within pulsing for semiconductor rf plasma processingLAM RES CORP·Filed 2025·Application pending·0 cites
- 3491US10658222B2Moveable edge coupling ring for edge process control during semiconductor wafer processingLAM RES CORP·Filed 2015·Granted May 19, 2020·7 cites·18 claims
- 3591US10410832B2Control of on-wafer CD uniformity with movable edge ring and gas injection adjustmentLAM RES CORP·Filed 2016·Granted Sep 10, 2019·8 cites·12 claims
- 3691US9966236B2Powered grid for plasma chamberLONG MAOLIN·Filed 2011·Granted May 8, 2018·13 cites·20 claims
- 3791US9230819B2Internal plasma grid applications for semiconductor fabrication in context of ion-ion plasma processingLAM RES CORP·Filed 2014·Granted Jan 5, 2016·15 cites·30 claims
- 3890US10580618B2Multi-level pulsing of DC and RF signalsLAM RES CORP·Filed 2019·Granted Mar 3, 2020·4 cites·25 claims
- 3990US10386828B2Methods and apparatuses for etch profile matching by surface kinetic model optimizationLAM RES CORP·Filed 2015·Granted Aug 20, 2019·8 cites·33 claims
- 4090US10304660B1Multi-level pulsing of DC and RF signalsLAM RES CORP·Filed 2018·Granted May 28, 2019·5 cites·41 claims
- 4190US9633846B2Internal plasma grid applications for semiconductor fabricationLAM RES CORP·Filed 2015·Granted Apr 25, 2017·8 cites·23 claims
- 4289US11462390B2Multi-level parameter and frequency pulsing with a low angular spreadLAM RES CORP·Filed 2020·Granted Oct 4, 2022·2 cites·23 claims
- 4389US11112773B2Systems for removing and replacing consumable parts from a semiconductor process module in situLAM RES CORP·Filed 2017·Granted Sep 7, 2021·5 cites·18 claims
- 4489US9245717B2Gas distribution system for ceramic showerhead of plasma etch reactorKANG MICHAEL·Filed 2011·Granted Jan 26, 2016·10 cites·17 claims
- 4589US2025106976A1Matchless plasma source for semiconductor wafer fabricationLAM RES CORP·Filed 2024·Application pending·0 cites
- 4688US10332725B2Systems and methods for reversing RF current polarity at one output of a multiple output RF matching networkLAM RES CORP·Filed 2015·Granted Jun 25, 2019·5 cites·18 claims
- 4788US7645710B2Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma systemAPPLIED MATERIALS INC·Filed 2007·Granted Jan 12, 2010·13 cites·19 claims
- 4887US9934979B2Gas distribution showerhead for inductively coupled plasma etch reactorLAM RES CORP·Filed 2015·Granted Apr 3, 2018·4 cites·28 claims
- 4987US9293353B2Faraday shield having plasma density decoupling structure between TCP coil zonesLONG MAOLIN·Filed 2012·Granted Mar 22, 2016·8 cites·10 claims
- 5086US12283461B2Systems and methods for achieving peak ion energy enhancement with a low angular spreadLAM RES CORP·Filed 2024·Granted Apr 22, 2025·0 cites·20 claims
Showing the top 50 of 120 patent records by PatentIndex Score.
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