Inventor · disambiguated record
Gottlieb S. Oehrlein
Also filed as: OEHRLEIN GOTTLIEB S · OEHRLEIN GOTTLIEB STEFAN
14 granted patents·2 pending applications·735 citations·filing 1991–2024
94Inventor score
Top patents by PatentIndex Score
16 records- 0196US5798016AApparatus for hot wall reactive ion etching using a dielectric or metallic liner with temperature control to achieve process stabilityIBM·Filed 1994·Granted Aug 25, 1998·219 cites·25 claims
- 0290US5155657AHigh area capacitor formation using material dependent etchingIBM·Filed 1991·Granted Oct 13, 1992·124 cites·34 claims
- 0388US9620382B2Reactor for plasma-based atomic layer etching of materialsUNIV MARYLAND·Filed 2014·Granted Apr 11, 2017·9 cites·17 claims
- 0486US5244730APlasma deposition of fluorocarbonIBM·Filed 1991·Granted Sep 14, 1993·45 cites·12 claims
- 0584US5153813AHigh area capacitor formation using dry etchingIBM·Filed 1991·Granted Oct 6, 1992·59 cites·25 claims
- 0683US6060400AHighly selective chemical dry etching of silicon nitride over silicon and silicon dioxideUNIV NEW YORK STATE RES FOUND·Filed 1998·Granted May 9, 2000·79 cites·11 claims
- 0782US5637237AMethod for hot wall reactive ion etching using a dielectric or metallic liner with temperature control to achieve process stabilityIBM·Filed 1995·Granted Jun 10, 1997·68 cites·17 claims
- 0881US5549935AAdhesion promotion of fluorocarbon filmsIBM·Filed 1995·Granted Aug 27, 1996·42 cites·19 claims
- 0981US5302420APlasma deposition of fluorocarbonIBM·Filed 1993·Granted Apr 12, 1994·37 cites·12 claims
- 1062US2025125124A1Electron beam-induced and remote plasma-assisted simultaneous material-selective etching and growthUNIV MARYLAND·Filed 2024·Application pending·0 cites
- 1161US7470329B2Method and system for nanoscale plasma processing of objectsUNIV MARYLAND·Filed 2004·Granted Dec 30, 2008·5 cites·35 claims
- 1260US5395769AMethod for controlling silicon etch depthIBM·Filed 1992·Granted Mar 7, 1995·33 cites·18 claims
- 1349US5788870APromotion of the adhesion of fluorocarbon filmsIBM·Filed 1995·Granted Aug 4, 1998·15 cites·17 claims
- 1446US2023059730A1Atomic-scale materials processing based on electron beam induced etching assisted by remote plasmaUNIV MARYLAND·Filed 2022·Application pending·0 cites
- 1544US10790157B1Achieving etching selectivity for atomic layer etching processes by utilizing material-selective deposition phenomenaUNIV MARYLAND·Filed 2019·Granted Sep 29, 2020·0 cites·20 claims
- 1641US11171013B2Leveraging precursor molecular composition and structure for atomic layer etchingUNIV MARYLAND·Filed 2019·Granted Nov 9, 2021·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →