Inventor · disambiguated record
Syogo Matsumaru
Also filed as: MATSUMARU SYOGO
7 granted patents·1 pending application·13 citations·filing 2004–2010
77Inventor score
Top patents by PatentIndex Score
8 records- 0179US7723007B2Polymer compound, photoresist composition including the polymer compound, and resist pattern formation methodTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted May 25, 2010·5 cites·13 claims
- 0270US7700259B2Polymer compound, photoresist composition containing such polymer compound, and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Apr 20, 2010·2 cites·14 claims
- 0364US7592122B2Photoresist composition, and low-molecular compound and high-molecular compound for the photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Sep 22, 2009·3 cites·6 claims
- 0462US8741538B2Polymer compound, photoresist composition containing such polymer compound, and method for forming resist patternOGATA TOSHIYUKI·Filed 2010·Granted Jun 3, 2014·1 cites·3 claims
- 0543US7807328B2Polymer compound, photoresist composition including the polymer compound, and resist pattern formation methodTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Oct 5, 2010·0 cites·6 claims
- 0641US2008193871A1Positive Resist Composition For Immersion Exposure and Method of Forming Resist PatternTOKYO OHKA KOGYO CO LTD·Filed 2005·Application pending·0 cites
- 0736US7682770B2Resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Mar 23, 2010·2 cites·14 claims
- 0829US7763412B2Polymer, positive resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Jul 27, 2010·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →