Inventor · disambiguated record
James J. Bucchignano
Also filed as: BUCCHIGNANO JAMES J
11 granted patents·1 pending application·137 citations·filing 1998–2010
89Inventor score
Files withIBM12
Top patents by PatentIndex Score
12 records- 0184US6043003AE-beam application to mask making using new improved KRS resist systemIBM·Filed 1999·Granted Mar 28, 2000·45 cites·19 claims
- 0279US6037097AE-beam application to mask making using new improved KRS resist systemIBM·Filed 1998·Granted Mar 14, 2000·50 cites·35 claims
- 0375US7695897B2Structures and methods for low-k or ultra low-k interlayer dielectric pattern transferIBM·Filed 2006·Granted Apr 13, 2010·6 cites·18 claims
- 0471US7659050B2High resolution silicon-containing resistIBM·Filed 2005·Granted Feb 9, 2010·3 cites·12 claims
- 0567US6251569B1Forming a pattern of a negative photoresistIBM·Filed 1999·Granted Jun 26, 2001·23 cites·25 claims
- 0662US7994639B2Microelectronic structure including dual damascene structure and high contrast alignment markIBM·Filed 2007·Granted Aug 9, 2011·2 cites·20 claims
- 0761US7399573B2Method for using negative tone silicon-containing resist for e-beam lithographyIBM·Filed 2006·Granted Jul 15, 2008·1 cites·15 claims
- 0860US6617086B2Forming a pattern of a negative photoresistIBM·Filed 2001·Granted Sep 9, 2003·5 cites·21 claims
- 0951US7893549B2Microelectronic lithographic alignment using high contrast alignment markIBM·Filed 2007·Granted Feb 22, 2011·1 cites·12 claims
- 1044US7566527B2Fused aromatic structures and methods for photolithographic applicationsIBM·Filed 2007·Granted Jul 28, 2009·1 cites·1 claims
- 1144US2010196806A1Structures and methods for low-k or ultra low-k interlayer dielectric pattern transferIBM·Filed 2010·Application pending·0 cites
- 1239US8029975B2Fused aromatic structures and methods for photolithographic applicationsIBM·Filed 2009·Granted Oct 4, 2011·0 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →