Inventor · disambiguated record
Young Cheol Yoo
Also filed as: YOO YOUNG CHEOL
5 granted patents·6 pending applications·100 citations·filing 1999–2016
72Inventor score
Top patents by PatentIndex Score
11 records- 0187US6262639B1Bandpass filter with dielectric resonatorsACE TECH·Filed 1999·Granted Jul 17, 2001·99 cites·8 claims
- 0262US8178073B2Making method for titania nanoparticleLIM HYUNG SUP·Filed 2009·Granted May 15, 2012·1 cites·8 claims
- 0348US8431627B2Filler material for crowns, crown material containing same, and method of manufacturing thereofLIM HYUNG SUP·Filed 2009·Granted Apr 30, 2013·0 cites·10 claims
- 0446US10221295B2Radioopaque peek based block for use in a CAD/CAM system for the manufacture of a dental restaurationSOC DE RECHERCHES TECHNIQUES DENTAIRES—RTD·Filed 2016·Granted Mar 5, 2019·0 cites·18 claims
- 0544US2012237866A1Making Method For Titania NanoparticleLIM HYUNG SUP·Filed 2012·Application pending·0 cites
- 0643US2015056438A1Hollow Silica Particles, Method of Manufacturing the Same, Composition Including the Same and Sheet with Inner CavitiesSUKGYUNG AT CO LTD·Filed 2014·Application pending·0 cites
- 0743US2015013568A1Glass Fillers Having Acid ResistanceSUKGYUNG AT CO LTD·Filed 2014·Application pending·0 cites
- 0835US11338560B2Functional fabric and manufacturing method thereforSUKGYUNG AT CO LTD·Filed 2015·Granted May 24, 2022·0 cites·17 claims
- 0932US2011264080A1Medical Devices Having Extremely High Radiopacity Containing Ytterbium CompoundSUKGYUNG AT CO LTD·Filed 2011·Application pending·0 cites
- 1031US2010297545A1Preparation Method of Composite Silica Nanoparticles with MonodispersitySUKGYUNG AT CO LTD·Filed 2010·Application pending·0 cites
- 1131US2017073237A1Method for manufacturing hollow silica particles, hollow silica particles, and composition and thermal insulation sheet comprising sameSUKGYUNG AT CO LTD·Filed 2015·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Young Cheol Yoo files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →