Inventor · disambiguated record
Roger R. Lowe-Webb
Also filed as: LOWE-WEBB ROGER R
13 granted patents·1,113 citations·filing 2000–2006
95Inventor score
Top patents by PatentIndex Score
13 records- 0197US7061615B1Spectroscopically measured overlay targetNANOMETRICS INC·Filed 2001·Granted Jun 13, 2006·221 cites·13 claims
- 0297US6982793B1Method and apparatus for using an alignment target with designed in offsetNANOMETRICS INC·Filed 2002·Granted Jan 3, 2006·216 cites·49 claims
- 0396US7372565B1Spectrometer measurement of diffracting structuresNANOMETRICS INC·Filed 2006·Granted May 13, 2008·46 cites·24 claims
- 0496US7236244B1Alignment target to be measured with multiple polarization statesNANOMETRICS INC·Filed 2005·Granted Jun 26, 2007·36 cites·15 claims
- 0596US6992764B1Measuring an alignment target with a single polarization stateNANOMETRICS INC·Filed 2002·Granted Jan 31, 2006·115 cites·24 claims
- 0696US6949462B1Measuring an alignment target with multiple polarization statesNANOMETRICS INC·Filed 2002·Granted Sep 27, 2005·77 cites·18 claims
- 0796US6522406B1Correcting the system polarization sensitivity of a metrology tool having a rotatable polarizerNANOMETRICS INC·Filed 2001·Granted Feb 18, 2003·119 cites·16 claims
- 0895US7046361B1Positioning two elements using an alignment target with a designed offsetNANOMETRICS INC·Filed 2002·Granted May 16, 2006·75 cites·25 claims
- 0994US7230705B1Alignment target with designed in offsetNANOMETRICS INC·Filed 2005·Granted Jun 12, 2007·69 cites·27 claims
- 1092US7115858B1Apparatus and method for the measurement of diffracting structuresNANOMETRICS INC·Filed 2000·Granted Oct 3, 2006·55 cites·16 claims
- 1187US7508976B1Local process variation correction for overlay measurementNANOMETRIC INC·Filed 2003·Granted Mar 24, 2009·41 cites·17 claims
- 1285US6958819B1Encoder with an alignment targetNANOMETRICS INC·Filed 2002·Granted Oct 25, 2005·28 cites·45 claims
- 1374US6970255B1Encoder measurement based on layer thicknessNANOMETRICS INC·Filed 2003·Granted Nov 29, 2005·15 cites·22 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →