Inventor · disambiguated record
Dai Oguro
Also filed as: OGURO DAI
23 granted patents·4 pending applications·92 citations·filing 2001–2014
94Inventor score
Top patents by PatentIndex Score
27 records- 0193US7871751B2Resist compositionMITSUBISHI GAS CHEMICAL CO·Filed 2005·Granted Jan 18, 2011·15 cites·34 claims
- 0289US8748078B2Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist patternHAYASHI HIROMI·Filed 2010·Granted Jun 10, 2014·6 cites·18 claims
- 0383US8846292B2Radiation-sensitive compositionECHIGO MASATOSHI·Filed 2011·Granted Sep 30, 2014·2 cites·11 claims
- 0482US7919223B2Compound for resist and radiation-sensitive compositionMITSUBISHI GAS CHEMICAL CO·Filed 2005·Granted Apr 5, 2011·3 cites·37 claims
- 0580US6447859B2Polyester resin and molded articleMITSUBISHI GAS CHEMICAL CO·Filed 2001·Granted Sep 10, 2002·23 cites·13 claims
- 0679US8110334B2Radiation-sensitive compositionECHIGO MASATOSHI·Filed 2007·Granted Feb 7, 2012·13 cites·4 claims
- 0777US8350096B2Compound for resist and radiation-sensitive compositionMITSUBISHI GAS CHEMICAL CO·Filed 2011·Granted Jan 8, 2013·1 cites·25 claims
- 0876US8829247B2Cyclic compound, method of producing the same, radiation sensitive composition, and method of forming resist patternHAYASHI HIROMI·Filed 2010·Granted Sep 9, 2014·3 cites·7 claims
- 0975US8592134B2Composition for forming base film for lithography and method for forming multilayer resist patternOGURO DAI·Filed 2008·Granted Nov 26, 2013·5 cites·18 claims
- 1072US7067186B2Thermoplastic resin compositionMITSUBISHI GAS CHEMICAL CO·Filed 2002·Granted Jun 27, 2006·10 cites·27 claims
- 1171US8802353B2Compound for resist and radiation-sensitive composition specificationECHIGO MASATOSHI·Filed 2012·Granted Aug 12, 2014·1 cites·2 claims
- 1271US6740376B2Polyester based resin composition and molded product therefromMITSUBISHI GAS CHEMICAL CO·Filed 2002·Granted May 25, 2004·10 cites·18 claims
- 1364US9605110B2Epoxy resin curing agentMITSUBISHI GAS CHEMICAL CO·Filed 2013·Granted Mar 28, 2017·0 cites·19 claims
- 1464US9234986B2Polyester resin and optical lensMITSUBISHI GAS CHEMICAL CO·Filed 2014·Granted Jan 12, 2016·0 cites·12 claims
- 1559US8563665B2Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compoundKITA SEIJI·Filed 2008·Granted Oct 22, 2013·0 cites·7 claims
- 1657US8524952B2Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compoundKITA SEIJI·Filed 2012·Granted Sep 3, 2013·0 cites·2 claims
- 1757US8519177B2Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compoundKITA SEIJI·Filed 2012·Granted Aug 27, 2013·0 cites·2 claims
- 1854US8674054B2Polyester resin and optical lensMINEZAKI TAKUYA·Filed 2010·Granted Mar 18, 2014·0 cites·11 claims
- 1950US9150491B2Bicyclohexane derivative compound and manufacturing method of the sameECHIGO MASATOSHI·Filed 2011·Granted Oct 6, 2015·0 cites·6 claims
- 2048US8324407B2Alcohol compound having dioxane structure and process for producing sameOGURO DAI·Filed 2010·Granted Dec 4, 2012·0 cites·8 claims
- 2148US2016244389A11,3-bis(hydroxyphenyl)-5-ethyladamantane compound and method for production thereof, and aromatic polycarbonate resin and method for production thereofMITSUBISHI GAS CHEMICAL CO·Filed 2014·Application pending·0 cites
- 2246US9897913B2Radiation-sensitive compositionMITSUBISHI GAS CHEMICAL CO·Filed 2014·Granted Feb 20, 2018·0 cites·5 claims
- 2345US8859787B2Glycol compound having dioxane structure and method for producing the sameMINEZAKI TAKUYA·Filed 2010·Granted Oct 14, 2014·0 cites·16 claims
- 2443US8846957B2Glycol compound having dioxane structure and method for producing the sameMINEZAKI TAKUYA·Filed 2010·Granted Sep 30, 2014·0 cites·14 claims
- 2538US2004191672A1Resist compositionFiled 2004·Application pending·0 cites
- 2637US2009176095A1Novel triphenylmethane derivative, organic gellant containing the same, organic gel, and organic fiberOGURO DAI·Filed 2005·Application pending·0 cites
- 2736US2007059632A1Method of manufacturing a semiconductor deviceOGURO DAI·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →