Inventor · disambiguated record
Masanori Miyabe
Also filed as: MIYABE MASANORI
6 granted patents·116 citations·filing 1986–1992
84Inventor score
Files withTOKYO OHKA KOGYO CO LTD6
Top patents by PatentIndex Score
6 records- 0187US4731319APositive-working naphthoquinone diazide photoresist composition with two cresol novolac resinsTOKYO OHKA KOGYO CO LTD·Filed 1986·Granted Mar 15, 1988·48 cites·2 claims
- 0268US4882260APositive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dyeTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Nov 21, 1989·19 cites·5 claims
- 0367US4906549APositive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atomsTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Mar 6, 1990·15 cites·5 claims
- 0461US5057397AElectron beam-curable resist composition and method for fine patterning using the sameTOKYO OHKA KOGYO CO LTD·Filed 1989·Granted Oct 15, 1991·20 cites·5 claims
- 0544US5180653AElectron beam-curable resist composition and method for fine patterning using the sameTOKYO OHKA KOGYO CO LTD·Filed 1991·Granted Jan 19, 1993·10 cites·3 claims
- 0638US5281508APositive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresolTOKYO OHKA KOGYO CO LTD·Filed 1992·Granted Jan 25, 1994·4 cites·3 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →