Inventor · disambiguated record
Remi Daniel Marie Edart
Also filed as: EDART REMI DANIEL MARIE
8 granted patents·1 pending application·88 citations·filing 2004–2015
87Inventor score
Files withASML NETHERLANDS BV6ASML NETHERLANDS N V1BEST KEITH FRANK1VAN DER SANDEN STEFAN CORNELIS THEODORUS1
Top patents by PatentIndex Score
9 records- 0192US9291916B2Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methodsASML NETHERLANDS BV·Filed 2015·Granted Mar 22, 2016·5 cites·12 claims
- 0292US8976355B2Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methodsVAN DER SANDEN STEFAN CORNELIS THEODORUS·Filed 2012·Granted Mar 10, 2015·19 cites·8 claims
- 0386US9454084B2Method to determine the usefulness of alignment marks to correct overlay, and a combination of a lithographic apparatus and an overlay measurement systemASML NETHERLANDS BV·Filed 2013·Granted Sep 27, 2016·5 cites·15 claims
- 0482US7259828B2Alignment system and method and device manufactured therebyASML NETHERLANDS BV·Filed 2004·Granted Aug 21, 2007·25 cites·40 claims
- 0582US7126669B2Method and system for automated process correction using model parameters, and lithographic apparatus using such method and systemASML NETHERLANDS BV·Filed 2004·Granted Oct 24, 2006·20 cites·21 claims
- 0679US8982347B2Alignment mark deformation estimating method, substrate position predicting method, alignment system and lithographic apparatusASML NETHERLANDS N V·Filed 2012·Granted Mar 17, 2015·8 cites·17 claims
- 0773US7317509B2Method and system for automated process correction using model parameters, and lithographic apparatus using such method and systemASML NETHERLANDS BV·Filed 2006·Granted Jan 8, 2008·3 cites·10 claims
- 0858US8576374B2Lithographic apparatus and methodBEST KEITH FRANK·Filed 2009·Granted Nov 5, 2013·3 cites·6 claims
- 0944US2009153825A1Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2008·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →