Inventor · disambiguated record
Franciscus Bernardus Maria Van Bilsen
Also filed as: VAN BILSEN FRANCISCUS B · VAN BILSEN FRANCISCUS B M · VAN BILSEN FRANCISCUS BERNARDU · VAN BILSEN FRANCISCUS BERNARDUS
27 granted patents·1 pending application·945 citations·filing 1998–2021
97Inventor score
Files withASML NETHERLANDS BV18ASM INC4ASM AMERICA3ASML NETHERLAND BV1VAN BILSEN FRANCISCUS BERNARDUS MARIA1
Top patents by PatentIndex Score
28 records- 0198US6121061AMethod of processing wafers with low mass supportASM INC·Filed 1998·Granted Sep 19, 2000·518 cites·34 claims
- 0296US7880880B2Alignment systems and methods for lithographic systemsASML NETHERLANDS BV·Filed 2005·Granted Feb 1, 2011·24 cites·15 claims
- 0395US7329888B2Alignment systems and methods for lithographic systemsASML NETHERLANDS BV·Filed 2005·Granted Feb 12, 2008·18 cites·28 claims
- 0494US6893507B2Self-centering wafer support systemASM INC·Filed 2002·Granted May 17, 2005·75 cites·29 claims
- 0594US6454865B1Low mass wafer support systemASM INC·Filed 2001·Granted Sep 24, 2002·82 cites·14 claims
- 0693US7297971B2Alignment systems and methods for lithographic systemsASML NETHERLANDS BV·Filed 2005·Granted Nov 20, 2007·12 cites·3 claims
- 0792US8139217B2Alignment systems and methods for lithographic systemsVAN BILSEN FRANCISCUS BERNARDUS MARIA·Filed 2010·Granted Mar 20, 2012·12 cites·18 claims
- 0890US10996176B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2020·Granted May 4, 2021·2 cites·19 claims
- 0990US7439531B2Alignment systems and methods for lithographic systemsASML NETHERLANDS BV·Filed 2006·Granted Oct 21, 2008·7 cites·32 claims
- 1090US7332732B2Alignment systems and methods for lithographic systemsASML NETHERLANDS BV·Filed 2003·Granted Feb 19, 2008·22 cites·143 claims
- 1190US6666924B1Reaction chamber with decreased wall depositionASM AMERICA·Filed 2000·Granted Dec 23, 2003·36 cites·10 claims
- 1289US10317191B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2017·Granted Jun 11, 2019·4 cites·21 claims
- 1388US7414722B2Alignment measurement arrangement and alignment measurement methodASML NETHERLANDS BV·Filed 2005·Granted Aug 19, 2008·10 cites·28 claims
- 1488US7042552B1Alignment strategy optimization methodASML NETHERLANDS BV·Filed 2004·Granted May 9, 2006·33 cites·8 claims
- 1587US6284048B1Method of processing wafers with low mass supportASM INC·Filed 2000·Granted Sep 4, 2001·34 cites·17 claims
- 1685US10746668B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2019·Granted Aug 18, 2020·2 cites·27 claims
- 1785US6564810B1Cleaning of semiconductor processing chambersASM AMERICA·Filed 2000·Granted May 20, 2003·20 cites·20 claims
- 1883US9594029B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2012·Granted Mar 14, 2017·4 cites·16 claims
- 1981US7651825B2Method and system for overlay control using dual metrology samplingASML NETHERLANDS BV·Filed 2006·Granted Jan 26, 2010·5 cites·8 claims
- 2074US11977034B2Methods and apparatus for measuring a property of a substrateASML NETHERLANDS BV·Filed 2021·Granted May 7, 2024·0 cites·18 claims
- 2169US7894063B2Lithographic methodASML NETHERLAND BV·Filed 2008·Granted Feb 22, 2011·2 cites·18 claims
- 2266US8018594B2Lithographic apparatus with multiple alignment arrangements and alignment measuring methodASML NETHERLANDS BV·Filed 2009·Granted Sep 13, 2011·1 cites·9 claims
- 2366US7271907B2Lithographic apparatus with two-dimensional alignment measurement arrangement and two-dimensional alignment measurement methodASML NETHERLANDS BV·Filed 2004·Granted Sep 18, 2007·8 cites·25 claims
- 2465US7763403B2Method and system for overlay control using dual metrology samplingASML NETHERLANDS BV·Filed 2009·Granted Jul 27, 2010·1 cites·9 claims
- 2561US7626701B2Lithographic apparatus with multiple alignment arrangements and alignment measuring methodASML NETHERLANDS BV·Filed 2004·Granted Dec 1, 2009·7 cites·25 claims
- 2652US8345245B2Lithographic apparatus with multiple alignment arrangements and alignment measuring methodASML NETHERLANDS BV·Filed 2011·Granted Jan 1, 2013·0 cites·9 claims
- 2748US6708700B2Cleaning of semiconductor processing chambersASM AMERICA·Filed 2003·Granted Mar 23, 2004·6 cites·17 claims
- 2848US2005183829A1Low-mass susceptor improvementsFiled 2005·Application pending·0 cites
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