Inventor · disambiguated record
Yoshimi Shioya
Also filed as: SHIOYA YOSHIMI
24 granted patents·7 pending applications·869 citations·filing 1981–2006
97Inventor score
Files withCANON SALES CO INC13FUJITSU LTD7SEMICONDUCTOR PROCESS LAB CO5SHIOYA YOSHIMI2CANON SALES CO INC AND SEMICON1
Top patents by PatentIndex Score
31 records- 0198US4625678AApparatus for plasma chemical vapor depositionFUJITSU LTD·Filed 1985·Granted Dec 2, 1986·272 cites·6 claims
- 0294US6479409B2Fabrication of a semiconductor device with an interlayer insulating film formed from a plasma devoid of an oxidizing agentCANON SALES CO INC·Filed 2001·Granted Nov 12, 2002·74 cites·20 claims
- 0392US6514855B1Semiconductor device manufacturing method having a porous insulating filmCANON SALES CO INC·Filed 2000·Granted Feb 4, 2003·77 cites·20 claims
- 0490US4804560AMethod of selectively depositing tungsten upon a semiconductor substrateFUJITSU LTD·Filed 1987·Granted Feb 14, 1989·125 cites·2 claims
- 0590US4394401AMethod of plasma enhanced chemical vapor deposition of phosphosilicate glass filmFUJITSU LTD·Filed 1981·Granted Jul 19, 1983·77 cites·10 claims
- 0687US6479408B2Semiconductor device and method of manufacturing the sameCANON SALES CO INC·Filed 2001·Granted Nov 12, 2002·38 cites·8 claims
- 0785US6642157B2Film forming method and semiconductor deviceCANON SALES CO INC·Filed 2000·Granted Nov 4, 2003·33 cites·20 claims
- 0882US6852651B2Semiconductor device and method of manufacturing the sameCANON SALES CO INC·Filed 2001·Granted Feb 8, 2005·23 cites·23 claims
- 0980US6645883B2Film forming method, semiconductor device and manufacturing method of the sameCANON SALES CO INC·Filed 2001·Granted Nov 11, 2003·24 cites·14 claims
- 1075US6673725B2Semiconductor device and method of manufacturing the sameCANON SALES CO INC·Filed 2001·Granted Jan 6, 2004·17 cites·11 claims
- 1170US6815824B2Semiconductor device and method of manufacturing the sameCANON SALES CO INC·Filed 2002·Granted Nov 9, 2004·10 cites·1 claims
- 1266US6630412B2Semiconductor device and method of manufacturing the sameCANON SALES CO INC·Filed 2001·Granted Oct 7, 2003·10 cites·18 claims
- 1365US6780790B2Semiconductor device and method of manufacturing the sameCANON SALES CO INC·Filed 2002·Granted Aug 24, 2004·6 cites·16 claims
- 1463US4906593AMethod of producing a contact plugFUJITSU LTD·Filed 1988·Granted Mar 6, 1990·22 cites·11 claims
- 1559US6472334B2Film forming method, semiconductor device manufacturing method, and semiconductor deviceCANON SALES CO INC·Filed 2001·Granted Oct 29, 2002·6 cites·15 claims
- 1656US6713383B2Semiconductor device manufacturing methodCANON SALES CO INC·Filed 2002·Granted Mar 30, 2004·5 cites·12 claims
- 1754US7238629B2Deposition method, method of manufacturing semiconductor device, and semiconductor deviceSEMICONDUCTOR PROCESS LAB CO·Filed 2004·Granted Jul 3, 2007·4 cites·11 claims
- 1854US6911405B2Semiconductor device and method of manufacturing the sameSEMICONDUCTOR PROCESS LAB CO·Filed 2001·Granted Jun 28, 2005·4 cites·18 claims
- 1951US7132171B2Low dielectric constant insulating film and method of forming the sameSEMICONDUCTOR PROCESS LAB CO·Filed 2004·Granted Nov 7, 2006·5 cites·13 claims
- 2051US6649495B2Manufacturing method of semiconductor deviceCANON SALES CO INC·Filed 2002·Granted Nov 18, 2003·3 cites·11 claims
- 2148US4513026AMethod for coating a semiconductor device with a phosphosilicate glassFUJITSU LTD·Filed 1983·Granted Apr 23, 1985·15 cites·9 claims
- 2247US4406053AProcess for manufacturing a semiconductor device having a non-porous passivation layerFUJITSU LTD·Filed 1981·Granted Sep 27, 1983·13 cites·9 claims
- 2344US7329612B2Semiconductor device and process for producing the sameSEMICONDUCTOR PROCESS LAB CO·Filed 2003·Granted Feb 12, 2008·0 cites·17 claims
- 2443US2009039475A1Apparatus and Method for Manufacturing SemiconductorSHIOYA YOSHIMI·Filed 2006·Application pending·0 cites
- 2542US2006251825A1Low dielectric constant insulating film and method of forming the sameSEMICONDUCTOR PROCESS LAB CO·Filed 2006·Application pending·0 cites
- 2639US2004057684A1Optical waveguide and method of manufacturing the sameYASUO KOKUBUN AND SEMICONDUCTO·Filed 2003·Application pending·0 cites
- 2738US2003104689A1Manufacturing method of semiconductor deviceCANON SALES CO INC AND SEMICON·Filed 2002·Application pending·0 cites
- 2838US2005221622A1Deposition method and semiconductor deviceSHIOYA YOSHIMI·Filed 2005·Application pending·0 cites
- 2936US2002151175A1Manufacturing method of semiconductor deviceFiled 2002·Application pending·0 cites
- 3035US4487787AMethod of growing silicate glass layers employing chemical vapor deposition processFUJITSU LTD·Filed 1982·Granted Dec 11, 1984·6 cites·8 claims
- 3131US2005263719A1Ultraviolet ray generator, ultraviolet ray irradiation processing apparatus, and semiconductor manufacturing systemOHDAIRA TOSHIYUKI·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →