Inventor · disambiguated record
Mario Garza
Also filed as: GARZA MARIO · GARZA MARIO C · GARZA MARIO J
32 granted patents·1 pending application·2,584 citations·filing 1992–2006
98Inventor score
Top patents by PatentIndex Score
33 records- 0199US6269472B1Optical proximity correction method and apparatusLSI LOGIC CORP·Filed 1997·Granted Jul 31, 2001·356 cites·22 claims
- 0299US5705301APerforming optical proximity correction with the aid of design rule checkersLSI LOGIC CORP·Filed 1996·Granted Jan 6, 1998·491 cites·18 claims
- 0398US6282696B1Performing optical proximity correction with the aid of design rule checkersLSI LOGIC CORP·Filed 1999·Granted Aug 28, 2001·278 cites·17 claims
- 0498US5723233AOptical proximity correction method and apparatusLSI LOGIC CORP·Filed 1996·Granted Mar 3, 1998·323 cites·17 claims
- 0597US6081659AComparing aerial image to actual photoresist pattern for masking process characterizationLSI LOGIC CORP·Filed 1999·Granted Jun 27, 2000·180 cites·13 claims
- 0697US6078738AComparing aerial image to SEM of photoresist or substrate pattern for masking process characterizationLSI LOGIC CORP·Filed 1997·Granted Jun 20, 2000·182 cites·13 claims
- 0793US5804340APhotomask inspection method and inspection tape thereforLSI LOGIC CORP·Filed 1996·Granted Sep 8, 1998·99 cites·15 claims
- 0892US5972541AReticle and method of design to correct pattern for depth of focus problemsLSI LOGIC CORP·Filed 1998·Granted Oct 26, 1999·96 cites·15 claims
- 0992US5900338APerforming optical proximity correction with the aid of design rule checkersLSI LOGIC CORP·Filed 1997·Granted May 4, 1999·86 cites·13 claims
- 1091US6768958B2Automatic calibration of a masking process simulatorLSI LOGIC CORP·Filed 2002·Granted Jul 27, 2004·35 cites·28 claims
- 1191US6499003B2Method and apparatus for application of proximity correction with unitary segmentationLSI LOGIC CORP·Filed 1998·Granted Dec 24, 2002·88 cites·13 claims
- 1288US7451721B1Utility location indicator apparatusGARZA MARIO J·Filed 2006·Granted Nov 18, 2008·51 cites·6 claims
- 1384US5795682AGuard rings to compensate for side lobe ringing in attenuated phase shift reticlesLSI LOGIC CORP·Filed 1996·Granted Aug 18, 1998·54 cites·17 claims
- 1483US6611953B1Mask correction optimizationLSI LOGIC CORP·Filed 2001·Granted Aug 26, 2003·23 cites·26 claims
- 1582US6782525B2Wafer process critical dimension, alignment, and registration analysis simulation toolLSI LOGIC CORP·Filed 2002·Granted Aug 24, 2004·23 cites·20 claims
- 1679US6532585B1Method and apparatus for application of proximity correction with relative segmentationLSI LOGIC CORP·Filed 2000·Granted Mar 11, 2003·15 cites·35 claims
- 1773US7313508B2Process window compliant corrections of design layoutLSI CORP·Filed 2002·Granted Dec 25, 2007·13 cites·25 claims
- 1870US6175953B1Method and apparatus for general systematic application of proximity correctionLSI LOGIC CORP·Filed 1998·Granted Jan 16, 2001·29 cites·30 claims
- 1970US5330883ATechniques for uniformizing photoresist thickness and critical dimension of underlying featuresLSI LOGIC CORP·Filed 1992·Granted Jul 19, 1994·31 cites·3 claims
- 2067US6868355B2Automatic calibration of a masking process simulatorLSI LOGIC CORP·Filed 2004·Granted Mar 15, 2005·7 cites·30 claims
- 2164US5549934AProcess of curing hydrogen silsesquioxane coating to form silicon oxide layerLSI LOGIC CORP·Filed 1995·Granted Aug 27, 1996·24 cites·15 claims
- 2262US5595861AMethod of selecting and applying a top antireflective coating of a partially fluorinated compoundLSI LOGIC CORP·Filed 1995·Granted Jan 21, 1997·18 cites·3 claims
- 2360US5456952AProcess of curing hydrogen silsesquioxane coating to form silicon oxide layerLSI LOGIC CORP·Filed 1994·Granted Oct 10, 1995·26 cites·19 claims
- 2458US7149340B2Mask defect analysis for both horizontal and vertical processing effectsLSI LOGIC CORP·Filed 2002·Granted Dec 12, 2006·12 cites·26 claims
- 2557US7264906B2OPC based illumination optimization with mask error constraintsLSI CORP·Filed 2004·Granted Sep 4, 2007·4 cites·9 claims
- 2655US6701511B1Optical and etch proximity correctionLSI LOGIC CORP·Filed 2001·Granted Mar 2, 2004·4 cites·4 claims
- 2754US6174630B1Method of proximity correction with relative segmentationLSI LOGIC CORP·Filed 1998·Granted Jan 16, 2001·12 cites·18 claims
- 2854US2007243028A1Synthetic ground coverGARZA MARIO C·Filed 2006·Application pending·0 cites
- 2952US5554486ATechniques for uniformizing photoresist thickness and critical dimension of underlying features through aerosol application of photoresistLSI LOGIC CORP·Filed 1994·Granted Sep 10, 1996·13 cites·6 claims
- 3051US7069535B2Optical proximity correction method using weighted prioritiesLSI LOGIC CORP·Filed 2003·Granted Jun 27, 2006·4 cites·27 claims
- 3137US6426131B1Off-axis pupil aperture and method for making the sameLSI LOGIC CORP·Filed 1999·Granted Jul 30, 2002·5 cites·28 claims
- 3234US5543265APhotoresist solution capable of being applied as an aerosol containing 3 to 12 percent by weight solventLSI LOGIC CORP·Filed 1995·Granted Aug 6, 1996·2 cites·4 claims
- 3330US5587267AMethod of forming photoresist film exhibiting uniform reflectivity through electrostatic depositionLSI LOGIC CORP·Filed 1995·Granted Dec 24, 1996·0 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →