Inventor · disambiguated record
Sang Ho Yu
Also filed as: YU SANG-HO
76 granted patents·21 pending applications·1,430 citations·filing 1997–2024
99Inventor score
Top patents by PatentIndex Score
97 records- 0197US9685371B2Method of enabling seamless cobalt gap-fillAPPLIED MATERIALS INC·Filed 2014·Granted Jun 20, 2017·35 cites·13 claims
- 0296US10790287B2Reducing gate induced drain leakage in DRAM wordlineAPPLIED MATERIALS INC·Filed 2018·Granted Sep 29, 2020·12 cites·10 claims
- 0396US8291857B2Apparatuses and methods for atomic layer depositionLAM HYMAN·Filed 2009·Granted Oct 23, 2012·375 cites·16 claims
- 0496US7416979B2Deposition methods for barrier and tungsten materialsAPPLIED MATERIALS INC·Filed 2006·Granted Aug 26, 2008·95 cites·38 claims
- 0596US6740585B2Barrier formation using novel sputter deposition method with PVD, CVD, or ALDAPPLIED MATERIALS INC·Filed 2002·Granted May 25, 2004·477 cites·39 claims
- 0695US10358719B2Selective deposition of aluminum oxide on metal surfacesAPPLIED MATERIALS INC·Filed 2017·Granted Jul 23, 2019·5 cites·17 claims
- 0795US9528183B2Cobalt removal for chamber clean or pre-clean processAPPLIED MATERIALS INC·Filed 2014·Granted Dec 27, 2016·25 cites·11 claims
- 0895US9330939B2Method of enabling seamless cobalt gap-fillZOPE BHUSHAN N·Filed 2013·Granted May 3, 2016·50 cites·18 claims
- 0995US8293015B2Apparatuses and methods for atomic layer depositionLAM HYMAN W H·Filed 2011·Granted Oct 23, 2012·21 cites·4 claims
- 1095US7611990B2Deposition methods for barrier and tungsten materialsAPPLIED MATERIALS INC·Filed 2008·Granted Nov 3, 2009·44 cites·25 claims
- 1194US11680313B2Selective deposition on non-metallic surfacesAPPLIED MATERIALS INC·Filed 2020·Granted Jun 20, 2023·3 cites·18 claims
- 1294US9048183B2NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursorsAPPLIED MATERIALS INC·Filed 2014·Granted Jun 2, 2015·14 cites·18 claims
- 1393US11621266B2Method of testing a gap fill for DRAMAPPLIED MATERIALS INC·Filed 2021·Granted Apr 4, 2023·2 cites·11 claims
- 1493US9169556B2Tungsten growth modulation by controlling surface compositionAPPLIED MATERIALS INC·Filed 2013·Granted Oct 27, 2015·9 cites·20 claims
- 1592US8187970B2Process for forming cobalt and cobalt silicide materials in tungsten contact applicationsGANGULI SESHADRI·Filed 2010·Granted May 29, 2012·12 cites·9 claims
- 1691US11552082B2Reducing gate induced drain leakage in DRAM wordlineAPPLIED MATERIALS INC·Filed 2020·Granted Jan 10, 2023·2 cites·10 claims
- 1791US8563424B2Process for forming cobalt and cobalt silicide materials in tungsten contact applicationsGANGULI SESHADRI·Filed 2012·Granted Oct 22, 2013·10 cites·20 claims
- 1891US8110489B2Process for forming cobalt-containing materialsGANGULI SESHADRI·Filed 2007·Granted Feb 7, 2012·15 cites·52 claims
- 1991US7867900B2Aluminum contact integration on cobalt silicide junctionAPPLIED MATERIALS INC·Filed 2008·Granted Jan 11, 2011·18 cites·5 claims
- 2090US8637390B2Metal gate structures and methods for forming thereofGANGULI SESHADRI·Filed 2011·Granted Jan 28, 2014·12 cites·13 claims
- 2189US9209074B2Cobalt deposition on barrier surfacesAPPLIED MATERIALS INC·Filed 2015·Granted Dec 8, 2015·5 cites·20 claims
- 2289US8865594B2Formation of liner and barrier for tungsten as gate electrode and as contact plug to reduce resistance and enhance device performanceLEE SANG-HYEOB·Filed 2012·Granted Oct 21, 2014·12 cites·17 claims
- 2389US8642468B2NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursorsGANGULI SESHADRI·Filed 2011·Granted Feb 4, 2014·9 cites·17 claims
- 2488US9129945B2Formation of liner and barrier for tungsten as gate electrode and as contact plug to reduce resistance and enhance device performanceLEE SANG-HYEOB·Filed 2010·Granted Sep 8, 2015·10 cites·14 claims
- 2587US11060188B2Selective deposition of aluminum oxide on metal surfacesAPPLIED MATERIALS INC·Filed 2019·Granted Jul 13, 2021·1 cites·13 claims
- 2687US10043709B2Methods for thermally forming a selective cobalt layerAPPLIED MATERIALS INC·Filed 2015·Granted Aug 7, 2018·5 cites·19 claims
- 2787US9748105B2Tungsten deposition with tungsten hexafluoride (WF6) etchbackAPPLIED MATERIALS INC·Filed 2014·Granted Aug 29, 2017·8 cites·19 claims
- 2887US8747556B2Apparatuses and methods for atomic layer depositionLAM HYMAN W H·Filed 2012·Granted Jun 10, 2014·3 cites·15 claims
- 2987US7755578B2Organic light emitting diode display device and driving method thereofLG DISPLAY CO LTD·Filed 2006·Granted Jul 13, 2010·8 cites·15 claims
- 3086US11171141B2Gap fill methods of forming buried word lines in DRAM without forming bottom voidsAPPLIED MATERIALS INC·Filed 2020·Granted Nov 9, 2021·2 cites·20 claims
- 3185US7378002B2Aluminum sputtering while biasing waferAPPLIED MATERIALS INC·Filed 2005·Granted May 27, 2008·6 cites·17 claims
- 3285US2024218503A1Selective cobalt deposition on copper surfacesAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3384US9051641B2Cobalt deposition on barrier surfacesLU JIANG·Filed 2008·Granted Jun 9, 2015·8 cites·25 claims
- 3482US10395916B2In-situ pre-clean for selectivity improvement for selective depositionAPPLIED MATERIALS INC·Filed 2017·Granted Aug 27, 2019·3 cites·20 claims
- 3582US9842769B2Method of enabling seamless cobalt gap-fillAPPLIED MATERIALS INC·Filed 2016·Granted Dec 12, 2017·3 cites·20 claims
- 3681US11282745B2Methods for filling features with rutheniumAPPLIED MATERIALS INC·Filed 2019·Granted Mar 22, 2022·2 cites·18 claims
- 3780US11959167B2Selective cobalt deposition on copper surfacesAPPLIED MATERIALS INC·Filed 2022·Granted Apr 16, 2024·0 cites·20 claims
- 3880US9017776B2Apparatuses and methods for atomic layer depositionAPPLIED MATERIALS INC·Filed 2012·Granted Apr 28, 2015·1 cites·6 claims
- 3980US7999768B2Organic light emitting diode display and driving method thereofLG DISPLAY CO LTD·Filed 2007·Granted Aug 16, 2011·6 cites·12 claims
- 4079US9653352B2Methods for forming metal organic tungsten for middle of the line (MOL) applicationsAPPLIED MATERIALS INC·Filed 2014·Granted May 16, 2017·4 cites·20 claims
- 4178US9938622B2Method to deposit CVD rutheniumAPPLIED MATERIALS INC·Filed 2016·Granted Apr 10, 2018·2 cites·20 claims
- 4277US10608097B2Low thickness dependent work-function nMOS integration for metal gateAPPLIED MATERIALS INC·Filed 2018·Granted Mar 31, 2020·2 cites·17 claims
- 4377US8815724B2Process for forming cobalt-containing materialsGANGULI SESHADRI·Filed 2012·Granted Aug 26, 2014·3 cites·10 claims
- 4476US11894233B2Electronic device having an oxygen free platinum group metal filmAPPLIED MATERIALS INC·Filed 2022·Granted Feb 6, 2024·0 cites·9 claims
- 4576US8654155B2Display device and method for driving the sameYU SANG-HO·Filed 2009·Granted Feb 18, 2014·5 cites·6 claims
- 4676US8284124B2Organic electroluminescent display device and driving method of the sameKIM JIN-HYOUNG·Filed 2006·Granted Oct 9, 2012·3 cites·10 claims
- 4776US6660135B2Staged aluminum deposition process for filling viasAPPLIED MATERIALS INC·Filed 2001·Granted Dec 9, 2003·21 cites·35 claims
- 4873US12000044B2Catalyzed deposition of metal filmsAPPLIED MATERIALS INC·Filed 2019·Granted Jun 4, 2024·1 cites·20 claims
- 4973US11075276B2Methods and apparatus for n-type metal oxide semiconductor (NMOS) metal gate materials using atomic layer deposition (ALD) processes with metal based precursorsAPPLIED MATERIALS INC·Filed 2019·Granted Jul 27, 2021·1 cites·16 claims
- 5073US10665542B2Cobalt manganese vapor phase depositionAPPLIED MATERIALS INC·Filed 2018·Granted May 26, 2020·0 cites·20 claims
Showing the top 50 of 97 patent records by PatentIndex Score.
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