Inventor · disambiguated record
Francisco Juarez
Also filed as: JUAREZ FRANCISCO · JUAREZ FRANCISCO J
14 granted patents·5 pending applications·584 citations·filing 2001–2023
94Inventor score
Top patents by PatentIndex Score
19 records- 0197US9362163B2Methods and apparatuses for atomic layer cleaning of contacts and viasLAM RES CORP·Filed 2014·Granted Jun 7, 2016·109 cites·17 claims
- 0296US6848458B1Apparatus and methods for processing semiconductor substrates using supercritical fluidsNOVELLUS SYSTEMS INC·Filed 2002·Granted Feb 1, 2005·162 cites·59 claims
- 0395US7503334B1Apparatus and methods for processing semiconductor substrates using supercritical fluidsNOVELLUS SYSTEMS INC·Filed 2005·Granted Mar 17, 2009·49 cites·13 claims
- 0494US6550484B1Apparatus for maintaining wafer back side and edge exclusion during supercritical fluid processingNOVELLUS SYSTEMS INC·Filed 2001·Granted Apr 22, 2003·91 cites·39 claims
- 0593US6867152B1Properties of a silica thin film produced by a rapid vapor deposition (RVD) processNOVELLUS SYSTEMS INC·Filed 2003·Granted Mar 15, 2005·83 cites·31 claims
- 0692US9554961B1Folding walkerJUAREZ FRANCISCO·Filed 2016·Granted Jan 31, 2017·13 cites·14 claims
- 0792US9082589B2Hybrid impedance matching for inductively coupled plasma systemTHOMAS GEORGE·Filed 2012·Granted Jul 14, 2015·16 cites·17 claims
- 0890US9918376B2Hybrid impedance matching for inductively coupled plasma systemNOVELLUS SYSTEMS INC·Filed 2015·Granted Mar 13, 2018·9 cites·20 claims
- 0990US9707149B1Folding walkerJUAREZ FRANCISCO·Filed 2016·Granted Jul 18, 2017·8 cites·3 claims
- 1089US6951765B1Method and apparatus for introduction of solid precursors and reactants into a supercritical fluid reactorNOVELLUS SYSTEMS INC·Filed 2001·Granted Oct 4, 2005·28 cites·15 claims
- 1187US7695597B1Conductive planarization assembly for electrochemical mechanical planarization of a work pieceNOVELLUS SYSTEMS INC·Filed 2006·Granted Apr 13, 2010·8 cites·21 claims
- 1272US7391086B1Conductive contacts and methods for fabricating conductive contacts for elctrochemical planarization of a work pieceNOVELLUS SYSTEMS INC·Filed 2006·Granted Jun 24, 2008·4 cites·21 claims
- 1357US7700155B1Method and apparatus for modulation of precursor exposure during a pulsed deposition processNOVELLUS SYSTEMS INC·Filed 2004·Granted Apr 20, 2010·2 cites·19 claims
- 1456US2010173074A1Method and apparatus for modulation of precursor exposure during a pulsed deposition processNOVELLUS SYSTEMS INC·Filed 2010·Application pending·0 cites
- 1555US2022228263A1Independently adjustable flowpath conductance in multi-station semiconductor processingLAM RES CORP·Filed 2020·Application pending·0 cites
- 1653US2025132127A1Transformer coupled plasma source design for thin dielectric film depositionLAM RES CORP·Filed 2022·Application pending·0 cites
- 1750US2025226227A1Deposition of metal-containing films and chamber cleanLAM RES CORP·Filed 2023·Application pending·0 cites
- 1844USD1000925SOutside corner mud plastering toolJUAREZ FRANCISCO J·Filed 2022·Granted Oct 10, 2023·2 cites·1 claims
- 1932US2022009279A1Mud-Plastering ScoopJUAREZ FRANCISCO J·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →