Inventor · disambiguated record
Josef Heindel
Also filed as: HEINDEL JOSEF
3 granted patents·7 pending applications·13 citations·filing 1995–2020
61Inventor score
Files withHERAEUS GMBH W C3MATERION ADVANCED MAT GERMANY GMBH2LEYBOLD MATERIALS GMBH1PAVEL HANS-JOACHIM1SIMONS CHRISTOPH1
Top patents by PatentIndex Score
10 records- 0161US2021071293A1Process for preparing a tubular articleMATERION ADVANCED MAT GERMANY GMBH·Filed 2020·Application pending·0 cites
- 0254US9334564B2Tube-shaped sputtering targetSIMONS CHRISTOPH·Filed 2012·Granted May 10, 2016·1 cites·25 claims
- 0354US8137518B2Magnetic shunts in tubular targetsPAVEL HANS-JOACHIM·Filed 2008·Granted Mar 20, 2012·1 cites·8 claims
- 0446US2005092455A1Processes for producing a sputtering target from a silicon-based alloy, a sputtering targetHERAEUS GMBH W C·Filed 2004·Application pending·0 cites
- 0544US2018105925A1Process for preparing a tubular articleMATERION ADVANCED MAT GERMANY GMBH·Filed 2016·Application pending·0 cites
- 0644US2004094283A1Processes for producing a sputtering target from a silicon-based alloy, a sputtering targetHERAEUS GMBH W C·Filed 2003·Application pending·0 cites
- 0741US6372104B1Cobalt base alloy sputtering target with high magnetic field penetrationLEYBOLD MATERIALS GMBH·Filed 1995·Granted Apr 16, 2002·11 cites·4 claims
- 0841US2006207740A1Processes for producing a sputtering target from a silicon-based alloy, a sputtering targetWEIGERT MARTIN·Filed 2006·Application pending·0 cites
- 0938US2003103857A1Sputter target made of a silicon alloy and process for producing a sputter targetHERAEUS GMBH W C·Filed 2002·Application pending·0 cites
- 1033US2003168333A1Metal or metal alloy based sputter target and method for the production thereofFiled 2001·Application pending·0 cites
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