Inventor · disambiguated record
Hiroki Tateno
Also filed as: TATENO HIROKI
10 granted patents·1 pending application·674 citations·filing 1987–2002
93Inventor score
Technology areasG03F
Top patents by PatentIndex Score
11 records- 0198US4908656AMethod of dimension measurement for a pattern formed by exposure apparatus, and method for setting exposure conditions and for inspecting exposure precisionNIKON CORP·Filed 1989·Granted Mar 13, 1990·152 cites·14 claims
- 0296US6876946B2Alignment method and apparatus thereforNIKON CORP·Filed 2002·Granted Apr 5, 2005·80 cites·25 claims
- 0394US6342941B1Exposure apparatus and method preheating a mask before exposing; a conveyance method preheating a mask before exposing; and a device manufacturing system and method manufacturing a device according to the exposure apparatus and methodNIKON CORP·Filed 2000·Granted Jan 29, 2002·62 cites·41 claims
- 0493US6278957B1Alignment method and apparatus thereforNIKON CORP·Filed 1999·Granted Aug 21, 2001·116 cites·8 claims
- 0590US5521036APositioning method and apparatusNIKON CORP·Filed 1995·Granted May 28, 1996·103 cites·17 claims
- 0685US5596204AMethod for aligning processing areas on a substrate with a predetermined position in a static coordinate systemNIKON CORP·Filed 1994·Granted Jan 21, 1997·47 cites·24 claims
- 0778US5448333AExposure methodNIKON CORP·Filed 1994·Granted Sep 5, 1995·36 cites·25 claims
- 0876US4803524AMethod of and apparatus for detecting the accuracy of superposition exposure in an exposure apparatusNIKON CORP·Filed 1987·Granted Feb 7, 1989·27 cites·21 claims
- 0971US5754300AAlignment method and apparatusNIPPON KOGAKU KK·Filed 1990·Granted May 19, 1998·26 cites·13 claims
- 1065US5666205AMeasuring method and exposure apparatusNIKON CORP·Filed 1995·Granted Sep 9, 1997·25 cites·15 claims
- 1140US2001049589A1Alignment method and apparatus thereforNIKON CORP·Filed 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →