Inventor · disambiguated record
Hisako Ishikawa
Also filed as: ISHIKAWA HISAKO
7 granted patents·7 pending applications·2 citations·filing 2010–2025
70Inventor score
Top patents by PatentIndex Score
14 records- 0180US10585348B2Pellicle, pellicle production method and exposure method using pellicleMITSUI CHEMICALS INC·Filed 2017·Granted Mar 10, 2020·2 cites·17 claims
- 0271US12287569B2Pellicle film for photolithography, pellicle, photolithography mask, photolithography system, and method of producing pellicle film for photolithographyMITSUI CHEMICALS INC·Filed 2021·Granted Apr 29, 2025·0 cites·14 claims
- 0370US2025216772A1Pellicle film for photolithography, pellicle, photolithography mask, photolithography system, and method of producing pellicle film for photolithographyMITSUI CHEMICALS INC·Filed 2025·Application pending·0 cites
- 0464US10106660B2Film containing a resin having a thiourethane bond and uses thereofMITSUI CHEMICALS INC·Filed 2016·Granted Oct 23, 2018·0 cites·5 claims
- 0559US2024402590A1Pellicle, exposure original plate, exposure device, and method of manufacturing pellicleMITSUI CHEMICALS INC·Filed 2022·Application pending·0 cites
- 0659US2024295809A1Pellicle frame, pellicle, method of producing pellicle, and method of evaluating pellicle frameMITSUI CHEMICALS INC·Filed 2022·Application pending·0 cites
- 0757US11852968B2Pellicle, exposure master, exposure device and method for manufacturing semiconductor deviceMITSUI CHEMICALS INC·Filed 2020·Granted Dec 26, 2023·0 cites·18 claims
- 0857US11137677B2Pellicle, exposure original plate, exposure device, and semiconductor device manufacturing methodMITSUI CHEMICALS INC·Filed 2019·Granted Oct 5, 2021·0 cites·13 claims
- 0957US2024377726A1Pellicle, exposure original plate, exposure device and pellicle production methodMITSUI CHEMICALS INC·Filed 2022·Application pending·0 cites
- 1053US10895805B2Pellicle manufacturing method and method for manufacturing photomask with pellicleMITSUI CHEMICALS INC·Filed 2017·Granted Jan 19, 2021·0 cites·20 claims
- 1152US2012225274A1Film and uses thereofISHIKAWA HISAKO·Filed 2010·Application pending·0 cites
- 1252US2023080753A1Pellicle, and production method thereforMITSUI CHEMICALS INC·Filed 2021·Application pending·0 cites
- 1343US2023036846A1Pellicle film, pellicle, original plate for exposure, exposure device, method of producing pellicle, and method of producing semiconductor deviceMITSUI CHEMICALS INC·Filed 2021·Application pending·0 cites
- 1438US10488751B2Pellicle, production method thereof, exposure methodMITSUI CHEMICALS INC·Filed 2017·Granted Nov 26, 2019·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →