Inventor · disambiguated record
Wolfram Karcher
Also filed as: KARCHER WOLFRAM
7 granted patents·2 pending applications·162 citations·filing 1998–2012
84Inventor score
Files withINFINEON TECHNOLOGIES AG7
Top patents by PatentIndex Score
9 records- 0193US6699747B2Method for increasing the capacitance in a storage trenchINFINEON TECHNOLOGIES AG·Filed 2002·Granted Mar 2, 2004·117 cites·14 claims
- 0274US6781180B1Trench capacitor and method for fabricating the sameINFINEON TECHNOLOGIES AG·Filed 2000·Granted Aug 24, 2004·21 cites·21 claims
- 0362US6664167B2Memory with trench capacitor and selection transistor and method for fabricating itINFINEON TECHNOLOGIES AG·Filed 2002·Granted Dec 16, 2003·9 cites·24 claims
- 0461US6326262B1Method for fabricating epitaxy layerINFINEON TECHNOLOGIES AG·Filed 2000·Granted Dec 4, 2001·8 cites·10 claims
- 0553US7049647B2Semiconductor memory cell with trench capacitor and selection transistor and method for fabricating itINFINEON TECHNOLOGIES AG·Filed 2003·Granted May 23, 2006·5 cites·13 claims
- 0640US10060023B2Backing plate for a sputter target, sputter target, and sputter deviceINFINEON TECHNOLOGIES AG·Filed 2012·Granted Aug 28, 2018·0 cites·21 claims
- 0737US2001030352A1Method for increasing the capacitance in a storage trench and trench capacitor having increased capacitanceFiled 2001·Application pending·0 cites
- 0835US2004048473A1Method for producing an integrated circuit, at least partially transforming an oxide layer into a conductive layerFiled 2001·Application pending·0 cites
- 0926US6194314B1Process for chemical vapor deposition layer production on a semiconductor surface with absorbing protective gassesINFINEON TECHNOLOGIES AG·Filed 1998·Granted Feb 27, 2001·2 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →