Inventor · disambiguated record
Kimberly Dona Pollard
Also filed as: POLLARD KIMBERLY · POLLARD KIMBERLY D · POLLARD KIMBERLY DONA
20 granted patents·8 pending applications·75 citations·filing 2004–2016
93Inventor score
Top patents by PatentIndex Score
28 records- 0188US7632796B2Dynamic multi-purpose composition for the removal of photoresists and method for its useDYNALOY LLC·Filed 2005·Granted Dec 15, 2009·14 cites·18 claims
- 0287US8987181B2Photoresist and post etch residue cleaning solutionDYNALOY LLC·Filed 2012·Granted Mar 24, 2015·13 cites·55 claims
- 0386US8466035B2Methods and compositions for doping silicon substrates with molecular monolayersDYNALOY LLC·Filed 2012·Granted Jun 18, 2013·9 cites·19 claims
- 0484US8263539B2Dynamic multi-purpose composition for the removal of photoresists and methods for its usePHENIS MICHAEL T·Filed 2006·Granted Sep 11, 2012·9 cites·20 claims
- 0583US7851427B2Compositions for reducing metal etch rates using stripper solutions containing copper saltsDYNALOY LLC·Filed 2010·Granted Dec 14, 2010·5 cites·15 claims
- 0681US9012387B2Metal conservation with stripper solutions containing resorcinolDYNALOY LLC·Filed 2013·Granted Apr 21, 2015·5 cites·10 claims
- 0779US9069259B2Dynamic multi-purpose compositions for the removal of photoresists and method for its usePHENIS MICHAEL·Filed 2013·Granted Jun 30, 2015·4 cites·15 claims
- 0877US8440389B2Stripper solutions effective for back-end-of-line operationsPOLLARD KIMBERLY DONA·Filed 2009·Granted May 14, 2013·7 cites·19 claims
- 0976US7655608B2Reduced metal etch rates using stripper solutions containing a copper saltDYNALOY LLC·Filed 2007·Granted Feb 2, 2010·4 cites·8 claims
- 1073US9158202B2Process and composition for removing substances from substratesDYNALOY LLC·Filed 2013·Granted Oct 13, 2015·2 cites·28 claims
- 1166US9291910B2Aqueous solution and process for removing substances from substratesDYNALOY LLC·Filed 2013·Granted Mar 22, 2016·1 cites·28 claims
- 1260US9243218B2Dynamic multipurpose composition for the removal of photoresists and method for its usePHENIS MICHAEL T·Filed 2009·Granted Jan 26, 2016·0 cites·20 claims
- 1359US8551682B2Metal conservation with stripper solutions containing resorcinolATKINSON JOHN M·Filed 2007·Granted Oct 8, 2013·2 cites·8 claims
- 1452US8835290B2Methods and compositions for doping silicon substrates with molecular monolayersDYNALOY LLC·Filed 2013·Granted Sep 16, 2014·0 cites·22 claims
- 1551US2009186793A1Dynamic multi-purpose composition for the removal of photoresists and method for its usePHENIS MICHAEL T·Filed 2006·Application pending·0 cites
- 1649US9329486B2Dynamic multi-purpose composition for the removal of photoresists and method for its useDYNALOY LLC·Filed 2014·Granted May 3, 2016·0 cites·19 claims
- 1749US2007243773A1Dynamic multi-purpose composition for the removal of photoresists and method for its usePHENIS MICHAEL T·Filed 2007·Application pending·0 cites
- 1848US10073352B2Aqueous solution and process for removing substances from substratesVERSUM MAT US LLC·Filed 2016·Granted Sep 11, 2018·0 cites·14 claims
- 1948US8853438B2Formulations of solutions and processes for forming a substrate including an arsenic dopantDYNALOY LLC·Filed 2012·Granted Oct 7, 2014·0 cites·34 claims
- 2047US2013161840A1Stripper solutions effective for back-end-of-line operationsDYNALOY LLC·Filed 2013·Application pending·0 cites
- 2145US9029268B2Process for etching metalsDYNALOY LLC·Filed 2012·Granted May 12, 2015·0 cites·20 claims
- 2245US8906774B2Methods and compositions for doping silicon substrates with molecular monolayersPOLLARD KIMBERLY DONA·Filed 2011·Granted Dec 9, 2014·0 cites·25 claims
- 2345US2005129580A1Microfluidic chemical reactor for the manufacture of chemically-produced nanoparticlesFiled 2004·Application pending·0 cites
- 2442US9650594B2Solutions and processes for removing substances from substratesDYNALOY LLC·Filed 2015·Granted May 16, 2017·0 cites·18 claims
- 2541US2015325442A1Formulations of Solutions and Processes for Forming a Substrate Including a DopantDYNALOY LLC·Filed 2014·Application pending·0 cites
- 2639US2015219996A1Composition for removing substances from substratesDYNALOY LLC·Filed 2014·Application pending·0 cites
- 2739US2015133356A1Photoresist and post etch residue cleaning solutionDYNALOY LLC·Filed 2015·Application pending·0 cites
- 2838US2010104824A1Dynamic multi-purpose composition for the removal of photoresistsPHENIS MICHAEL T·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →