Inventor · disambiguated record
Dana L. Durham
Also filed as: DURHAM DANA · DURHAM DANA L
39 granted patents·858 citations·filing 1985–2008
98Inventor score
Top patents by PatentIndex Score
39 records- 0191US5994430AAntireflective coating compositions for photoresist compositions and use thereofCLARIANT FINANCE BVI LTD·Filed 1997·Granted Nov 30, 1999·42 cites·22 claims
- 0290US6677286B1Compositions for removing etching residue and use thereofAIR PROD & CHEM·Filed 2002·Granted Jan 13, 2004·54 cites·15 claims
- 0386US7687447B2Semi-aqueous stripping and cleaning composition containing aminobenzenesulfonic acidAIR PROD & CHEM·Filed 2008·Granted Mar 30, 2010·11 cites·20 claims
- 0485US5981145ALight absorbing polymersCLARIANT FINANCE BVI LTD·Filed 1997·Granted Nov 9, 1999·59 cites·7 claims
- 0584US6951710B2Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereofAIR PROD & CHEM·Filed 2003·Granted Oct 4, 2005·39 cites·10 claims
- 0684US6821352B2Compositions for removing etching residue and use thereofAIR PROD & CHEM·Filed 2003·Granted Nov 23, 2004·29 cites·18 claims
- 0781US5733714AAntireflective coating for photoresist compositionsCLARIANT FINANCE BVI LTD·Filed 1996·Granted Mar 31, 1998·78 cites·28 claims
- 0881US4983490APhotoresist treating composition consisting of a mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetateHOECHST CELANESE CORP·Filed 1989·Granted Jan 8, 1991·30 cites·10 claims
- 0979US5286606AProcess for producing a developer having a low metal ion levelHOECHST CELANESE CORP·Filed 1992·Granted Feb 15, 1994·32 cites·9 claims
- 1077US5476750AMetal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresistsHOECHST CELANESE CORP·Filed 1992·Granted Dec 19, 1995·32 cites·7 claims
- 1177US5019488AMethod of producing an image reversal negative photoresist having a photo-labile blocked imideHOECHST CELANESE CORP·Filed 1990·Granted May 28, 1991·34 cites·35 claims
- 1276US4931381AImage reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatmentHOECHST CELANESE CORP·Filed 1988·Granted Jun 5, 1990·27 cites·16 claims
- 1375US5652297AAqueous antireflective coatings for photoresist compositionsHOECHST CELANESE CORP·Filed 1996·Granted Jul 29, 1997·38 cites·19 claims
- 1475US4588670ALight-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresistHOECHST CO AMERICAN·Filed 1985·Granted May 13, 1986·25 cites·17 claims
- 1574US6187506B1Antireflective coating for photoresist compositionsCLARIANT FINANCE BVI LTD·Filed 1999·Granted Feb 13, 2001·38 cites·28 claims
- 1672US5516886AMetal ion reduction in top anti-reflective coatings for photoresistsHOECHST CELANESE CORP·Filed 1994·Granted May 14, 1996·21 cites·9 claims
- 1769US5652317AAntireflective coatings for photoresist compositionsHOECHST CELANESE CORP·Filed 1996·Granted Jul 29, 1997·28 cites·18 claims
- 1868US4692398AProcess of using photoresist treating composition containing a mixture of a hexa-alkyl disilazane, propylene glycol alkyl ether and propylene glycol alkyl ether acetateHOECHST CO AMERICAN·Filed 1985·Granted Sep 8, 1987·18 cites·6 claims
- 1967US5399456AImage reversal negative working photoresist containing O-quinone diazide and cross-linking compoundHOECHST CELANESE CORP·Filed 1992·Granted Mar 21, 1995·19 cites·11 claims
- 2066US5374693ANovolak resin blends for photoresist applicationsHOECHST CELANESE CORP·Filed 1992·Granted Dec 20, 1994·16 cites·10 claims
- 2163US6368421B1Composition for stripping photoresist and organic materials from substrate surfacesCLARIANT FINANCE BVI LTD·Filed 1998·Granted Apr 9, 2002·24 cites·10 claims
- 2263US5688893AMethod of using a Lewis base to control molecular weight of novolak resinsHOECHST CELANESE CORP·Filed 1996·Granted Nov 18, 1997·18 cites·5 claims
- 2362US5543263APhotoresist having a low level of metal ionsHOECHST CELANESE CORP·Filed 1994·Granted Aug 6, 1996·16 cites·3 claims
- 2462US4948697APositive photoresist with a solvent mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetateHOECHST CELANESE CORP·Filed 1989·Granted Aug 14, 1990·14 cites·13 claims
- 2556US5624789AMetal ion reduction in top anti-reflective coatings for photoresisisHOECHST CELANESE CORP·Filed 1995·Granted Apr 29, 1997·14 cites·10 claims
- 2654US6106995AAntireflective coating material for photoresistsCLARIANT FINANCE BVI LTD·Filed 1999·Granted Aug 22, 2000·14 cites·17 claims
- 2752US5665517AAcidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefromHOECHST CELANESE CORP·Filed 1996·Granted Sep 9, 1997·15 cites·8 claims
- 2852US5039594APositive photoresist containing a mixture of propylene glycol alkyl ethers and propylene glycol alkyl ether acetateHOECHST CELANESE CORP·Filed 1990·Granted Aug 13, 1991·11 cites·13 claims
- 2949US4929536AImage reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curingHOECHST CELANESE CORP·Filed 1988·Granted May 29, 1990·13 cites·16 claims
- 3049US4806458AComposition containing a mixture of hexa-alkyl disilazane and propylene glycol alkyl ether and/or propylene glycol alkyl ether acetateHOECHST CELANESE CORP·Filed 1987·Granted Feb 21, 1989·8 cites·10 claims
- 3146US5876897APositive photoresists containing novel photoactive compoundsCLARIANT FINANCE BVI LTD·Filed 1997·Granted Mar 2, 1999·9 cites·19 claims
- 3244US5646218ANovolak resin blends for photoresist applicationsHOECHST CELANESE CORP·Filed 1996·Granted Jul 8, 1997·7 cites·27 claims
- 3343US5256522AImage reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curingHOECHST CELANESE CORP·Filed 1991·Granted Oct 26, 1993·7 cites·21 claims
- 3443US5248585APolyphosphazene binder resins for photoresists comprising as photosensitizers o-quinone diazide estersHOECHST CELANESE CORP·Filed 1991·Granted Sep 28, 1993·5 cites·10 claims
- 3540US5594098AMetal ion reduction in novolak resins and photoresistsHOECHST CELANESE CORP·Filed 1994·Granted Jan 14, 1997·3 cites·7 claims
- 3637US5217840AImage reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefromHOECHST CELANESE CORP·Filed 1990·Granted Jun 8, 1993·5 cites·22 claims
- 3735US5866295APhotosensitive quinolone compounds and a process of preparationCLARIANT FINANCE BVI LTD·Filed 1997·Granted Feb 2, 1999·3 cites·9 claims
- 3832US5614349AUsing a Lewis base to control molecular weight of novolak resinsHOECHST CELANESE CORP·Filed 1992·Granted Mar 25, 1997·1 cites·6 claims
- 3931US5580949AMetal ion reduction in novolak resins and photoresistsHOECHST CELANESE CORP·Filed 1995·Granted Dec 3, 1996·1 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →