Inventor · disambiguated record
Johannes Mathias Theodorus Antonius Adriaens
Also filed as: ADRIAENS JOHANNES MATHIAS T A · ADRIAENS JOHANNES MATHIAS THEO · ADRIAENS JOHANNES MATHIAS THEODORUS ANTHONIUS · ADRIAENS JOHANNES MATHIAS THEODORUS ANTONIUS
9 granted patents·1 pending application·29 citations·filing 2004–2020
83Inventor score
Top patents by PatentIndex Score
10 records- 0189US9470988B2Substrate positioning system, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2013·Granted Oct 18, 2016·10 cites·15 claims
- 0275US7557903B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Jul 7, 2009·4 cites·8 claims
- 0367US7684011B2Calibration method for a lithographic apparatusASML NETHERLANDS BV·Filed 2007·Granted Mar 23, 2010·2 cites·31 claims
- 0467US7102736B2Method of calibration, calibration substrate, and method of device manufactureASML NETHERLANDS BV·Filed 2004·Granted Sep 5, 2006·10 cites·36 claims
- 0565US7283249B2Lithographic apparatus and a method of calibrating such an apparatusASML NETHERLANDS BV·Filed 2005·Granted Oct 16, 2007·2 cites·18 claims
- 0647US11619886B2Position measurement system, interferometer system and lithographic apparatusASML NETHERLANDS BV·Filed 2019·Granted Apr 4, 2023·0 cites·20 claims
- 0744US11940264B2Mirror calibrating method, a position measuring method, a lithographic apparatus and a device manufacturing methodASML NETHERLANDS BV·Filed 2020·Granted Mar 26, 2024·0 cites·20 claims
- 0842US2006139595A1Lithographic apparatus and method for determining Z position errors/variations and substrate table flatnessASML NETHERLANDS BV·Filed 2004·Application pending·0 cites
- 0941US8330941B2Calibration method for a lithographic apparatusSCHOORMANS CAROLUS JOHANNES CATHARINA·Filed 2010·Granted Dec 11, 2012·0 cites·17 claims
- 1041US7352473B2Lithographic apparatus, device manufacturing method, and computer programASML NETHERLANDS BV·Filed 2004·Granted Apr 1, 2008·1 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →