Inventor · disambiguated record
Mao-Ying Wang
Also filed as: WANG MAO-YING
15 granted patents·10 pending applications·11 citations·filing 2007–2025
86Inventor score
Top patents by PatentIndex Score
25 records- 0195US11309316B1Semiconductor device with single step height and method for fabricating the sameNANYA TECHNOLOGY CORP·Filed 2020·Granted Apr 19, 2022·6 cites·18 claims
- 0284US2025234520A1Semiconductor structure including polysilicon as bottom layer of bit line structure and method of manufacturing the sameNANYA TECHNOLOGY CORP·Filed 2024·Application pending·0 cites
- 0380US12230450B2Semiconductor structureNANYA TECHNOLOGY CORP·Filed 2024·Granted Feb 18, 2025·0 cites·8 claims
- 0480US2025234518A1Semiconductor structure including polysilicon as bottom layer of bit line structure and method of manufacturing the sameNANYA TECHNOLOGY CORP·Filed 2024·Application pending·0 cites
- 0580US2025234516A1Semiconductor structure including polysilicon as bottom layer of bit line structure and method of manufacturing the sameNANYA TECHNOLOGY CORP·Filed 2024·Application pending·0 cites
- 0676US11063011B1Chip and wafer having multi-layered padNANYA TECHNOLOGY CORP·Filed 2020·Granted Jul 13, 2021·1 cites·14 claims
- 0775US11189523B2Semiconductor structure and fabrication method thereofNANYA TECHNOLOGY CORP·Filed 2019·Granted Nov 30, 2021·2 cites·3 claims
- 0872US2025132098A1Semiconductor structureNANYA TECHNOLOGY CORP·Filed 2025·Application pending·0 cites
- 0968US11942277B2Method of manufacturing semiconductor structure and semiconductor structureNANYA TECHNOLOGY CORP·Filed 2021·Granted Mar 26, 2024·0 cites·6 claims
- 1063US11588011B2Method of capacitance structure manufacturingNANYA TECHNOLOGY CORP·Filed 2022·Granted Feb 21, 2023·0 cites·6 claims
- 1162US11683928B2Semiconductor device with single step heightNANYA TECHNOLOGY CORP·Filed 2021·Granted Jun 20, 2023·0 cites·8 claims
- 1262US11404533B2Capacitance structure and manufacturing method thereofNANYA TECHNOLOGY CORP·Filed 2020·Granted Aug 2, 2022·0 cites·9 claims
- 1360US2022028734A1Semiconductor structureNANYA TECHNOLOGY CORP·Filed 2021·Application pending·0 cites
- 1457US7754614B2Nonvolatile memory device and method for fabricating the sameNANYA TECHNOLOGIES CORP·Filed 2008·Granted Jul 13, 2010·2 cites·11 claims
- 1555US11621318B2Capacitor, semiconductor device, and method for preparing capacitorNANYA TECHNOLOGY CORP·Filed 2021·Granted Apr 4, 2023·0 cites·9 claims
- 1651US7709318B2Method for fabricating a semiconductor deviceNANYA TECHNOLOGY CORP·Filed 2007·Granted May 4, 2010·0 cites·13 claims
- 1748US11437383B1Method for fabricating dynamic random access memory devicesNANYA TECHNOLOGY CORP·Filed 2021·Granted Sep 6, 2022·0 cites·14 claims
- 1844US10573602B2Semiconductor device and method of forming the sameNANYA TECHNOLOGY CORP·Filed 2018·Granted Feb 25, 2020·0 cites·14 claims
- 1944US8093639B2Method for fabricating a semiconductor deviceHO JAR-MING·Filed 2010·Granted Jan 10, 2012·0 cites·6 claims
- 2044US2009017604A1Method for fabricating a semiconductor deviceNANYA TECHNOLOGY CORP·Filed 2007·Application pending·0 cites
- 2142US8368134B2Nonvolatile memory device and method for fabricating the sameNANYA TECHNOLOGY CORP·Filed 2010·Granted Feb 5, 2013·0 cites·6 claims
- 2242US2020176377A1Electronic device and method of manufacturing the sameNANYA TECHNOLOGY CORP·Filed 2019·Application pending·0 cites
- 2340US2020286777A1Interconnect structure and method for preparing the sameNANYA TECHNOLOGY CORP·Filed 2019·Application pending·0 cites
- 2440US2020286775A1Interconnect structure and method for preparing the sameNANYA TECHNOLOGY CORP·Filed 2019·Application pending·0 cites
- 2538US2020035629A1Packaged semiconductor device and method for preparing the sameNANYA TECHNOLOGY CORP·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →