Inventor · disambiguated record
Kunihiro Tada
Also filed as: TADA KUNIHIRO
19 granted patents·11 pending applications·364 citations·filing 1995–2024
95Inventor score
Top patents by PatentIndex Score
30 records- 0193US5709757AFilm forming and dry cleaning apparatus and methodTOKYO ELECTRON LTD·Filed 1995·Granted Jan 20, 1998·160 cites·63 claims
- 0282US8257790B2Ti-containing film formation method and storage mediumNARUSHIMA KENSAKU·Filed 2007·Granted Sep 4, 2012·6 cites·20 claims
- 0380US7737005B2Method for forming Ti film and TiN film, contact structure, computer readable storing medium and computer programTOKYO ELECTRON LTD·Filed 2005·Granted Jun 15, 2010·6 cites·15 claims
- 0476US7484513B2Method of forming titanium film by CVDTOKYO ELECTRON LTD·Filed 2005·Granted Feb 3, 2009·6 cites·10 claims
- 0571US8106335B2Processing apparatus and heater unitMURAKAMI SEISHI·Filed 2005·Granted Jan 31, 2012·5 cites·11 claims
- 0668US7153773B2TiSiN film forming method, diffusion barrier TiSiN film, semiconductor device, method of fabricating the same and TiSiN film forming systemTOKYO ELECTRON LTD·Filed 2004·Granted Dec 26, 2006·9 cites·15 claims
- 0768US5942282AMethod for depositing a titanium filmTOKYO ELECTRON LTD·Filed 1998·Granted Aug 24, 1999·36 cites·2 claims
- 0867US6051281AMethod of forming a titanium film and a barrier metal film on a surface of a substrate through laminationTOKYO ELECTRON LTD·Filed 1997·Granted Apr 18, 2000·33 cites·7 claims
- 0964US6451388B1Method of forming titanium film by chemical vapor depositionTOKYO ELECTRON LTD·Filed 2000·Granted Sep 17, 2002·12 cites·18 claims
- 1061US6919273B1Method for forming TiSiN film, diffusion preventive film comprising TiSiN film, semiconductor device and its production method, and apparatus for forming TiSiN filmTOKYO ELECTRON LTD·Filed 1999·Granted Jul 19, 2005·21 cites·9 claims
- 1161US2024337022A1Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1258US8124168B2Substrate processing method and substrate processing apparatusTADA KUNIHIRO·Filed 2006·Granted Feb 28, 2012·2 cites·7 claims
- 1356US6537621B1Method of forming a titanium film and a barrier film on a surface of a substrate through laminationTOKYO ELECTRON LTD·Filed 1999·Granted Mar 25, 2003·20 cites·20 claims
- 1455US8785310B2Method of forming conformal metal silicide filmsHASEGAWA TOSHIO·Filed 2012·Granted Jul 22, 2014·1 cites·22 claims
- 1555US6841203B2Method of forming titanium film by CVDTOKYO ELECTRON LTD·Filed 2002·Granted Jan 11, 2005·5 cites·14 claims
- 1650US2024290609A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1749US6177149B1Method of forming titanium film by CVDTOKYO ELECTRON LTD·Filed 1998·Granted Jan 23, 2001·13 cites·15 claims
- 1846US6197674B1CVD-Ti film forming methodTOKYO ELECTRON LTD·Filed 1998·Granted Mar 6, 2001·12 cites·8 claims
- 1945US2009071404A1Method of forming titanium film by CVDTADA KUNIHIRO·Filed 2008·Application pending·0 cites
- 2045US2010216304A1Method for forming ti film and tin film, contact structure, computer readable storage medium and computer programTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 2144US10815567B2Deposition device and deposition methodTOKYO ELECTRON LTD·Filed 2015·Granted Oct 27, 2020·0 cites·6 claims
- 2242US6069093AProcess of forming metal films and multi layer structureTOKYO ELECTRON LTD·Filed 1998·Granted May 30, 2000·9 cites·7 claims
- 2342US6004872AMethod of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 1997·Granted Dec 21, 1999·8 cites·5 claims
- 2439US2005233093A1Film formation method and apparatus utilizing plasma CVDTADA KUNIHIRO·Filed 2005·Application pending·0 cites
- 2539US2007131168A1Gas Supplying unit and substrate processing apparatusGOMI HISASHI·Filed 2006·Application pending·0 cites
- 2638US2010240216A1Film formation method and apparatus utilizing plasma cvdTADA KUNIHIRO·Filed 2010·Application pending·0 cites
- 2737US2006231032A1Film-forming method and apparatus using plasma CVDMURAKAMI SEISHI·Filed 2005·Application pending·0 cites
- 2836US2006105104A1Method for introducing gas to treating apparatus having shower head portionTADA KUNIHIRO·Filed 2003·Application pending·0 cites
- 2935US2008057344A1Formation of Titanium Nitride FilmMURAKAMI SEISHI·Filed 2004·Application pending·0 cites
- 3034US2005257747A1Worktable device, film formation apparatus, and film formation method for semiconductor processWAKABAYASHI SATOSHI·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →