Inventor · disambiguated record
Matthias Lipinski
Also filed as: LIPINSKI MATTHIAS
19 granted patents·4 pending applications·151 citations·filing 2000–2011
93Inventor score
Top patents by PatentIndex Score
23 records- 0187US6835663B2Hardmask of amorphous carbon-hydrogen (a-C:H) layers with tunable etch resistivityINFINEON TECHNOLOGIES AG·Filed 2002·Granted Dec 28, 2004·43 cites·11 claims
- 0285US6576358B2Method of discharging reaction water in PEM fuel cells and fuel cell for carrying out the methodSIEMENS AG·Filed 2001·Granted Jun 10, 2003·28 cites·7 claims
- 0385US6503655B1Gas diffusion electrode and its productionSIEMENS AG·Filed 2000·Granted Jan 7, 2003·31 cites·30 claims
- 0480US8071261B2Lithography masks and methods of manufacture thereofGUTMANN ALOIS·Filed 2007·Granted Dec 6, 2011·6 cites·37 claims
- 0571US8349528B2Semiconductor devices and methods of manufacturing thereofINFINEON TECHNOLOGIES AG·Filed 2011·Granted Jan 8, 2013·2 cites·18 claims
- 0671US6361666B1Gas diffusion electron, process for producing an electrode an carbonizable compositeSIEMENS AG·Filed 2000·Granted Mar 26, 2002·9 cites·31 claims
- 0769US7674350B2Feature dimension control in a manufacturing processINFINEON TECHNOLOGIES AG·Filed 2007·Granted Mar 9, 2010·2 cites·18 claims
- 0867US6933538B2Plasma encapsulation for electronic and microelectronic components such as organic light emitting diodesOSRAM OPTO SEMICONDUCTORS GMBH·Filed 2001·Granted Aug 23, 2005·12 cites·29 claims
- 0966US8697339B2Semiconductor device manufacturing methodsZHUANG HAOREN·Filed 2011·Granted Apr 15, 2014·2 cites·22 claims
- 1065US7223525B2Process for generating a hard mask for the patterning of a layerINFINEON TECHNOLOGIES AG·Filed 2004·Granted May 29, 2007·9 cites·6 claims
- 1164US7794903B2Metrology systems and methods for lithography processesINFINEON TECHNOLOGIES AG·Filed 2006·Granted Sep 14, 2010·1 cites·15 claims
- 1257US6815364B2Tungsten hard maskINFINEON TECHNOLOGIES CORP·Filed 2001·Granted Nov 9, 2004·6 cites·21 claims
- 1352US8394574B2Metrology systems and methods for lithography processesSARMA CHANDRASEKHAR·Filed 2011·Granted Mar 12, 2013·0 cites·24 claims
- 1451US8007985B2Semiconductor devices and methods of manufacturing thereofINFINEON TECHNOLOGIES AG·Filed 2006·Granted Aug 30, 2011·0 cites·18 claims
- 1550US7842579B2Method for manufacturing a semiconductor device having doped and undoped polysilicon layersINFINEON TECHNOLOGIES AG·Filed 2007·Granted Nov 30, 2010·0 cites·21 claims
- 1649US8067135B2Metrology systems and methods for lithography processesSARMA CHANDRASEKHAR·Filed 2010·Granted Nov 29, 2011·0 cites·7 claims
- 1747US7892939B2Threshold voltage consistency and effective width in same-substrate device groupsINFINEON TECHNOLOGIES AG·Filed 2008·Granted Feb 22, 2011·0 cites·19 claims
- 1847US2008286698A1Semiconductor device manufacturing methodsZHUANG HAOREN·Filed 2007·Application pending·0 cites
- 1946US2010120177A1Feature Dimension Control in a Manufacturing ProcessINFINEON TECHNOLOGIES AG·Filed 2010·Application pending·0 cites
- 2043US8063406B2Semiconductor device having a polysilicon layer with a non-constant doping profileZHUANG HAOREN·Filed 2010·Granted Nov 22, 2011·0 cites·13 claims
- 2139US2007239305A1Process control systems and methodsZHUANG HAOREN·Filed 2006·Application pending·0 cites
- 2238US7541234B2Methods of fabricating integrated circuit transistors by simultaneously removing a photoresist layer and a carbon-containing layer on different active areasSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jun 2, 2009·0 cites·16 claims
- 2337US2004203242A1System and method for performing a metal layer RIE processFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →