Inventor · disambiguated record
Naohiko Okunishi
Also filed as: OKUNISHI NAOHIKO
26 granted patents·7 pending applications·43 citations·filing 2008–2025
93Inventor score
Top patents by PatentIndex Score
33 records- 0189US8398815B2Plasma processing apparatusYAMAZAWA YOHEI·Filed 2008·Granted Mar 19, 2013·12 cites·32 claims
- 0285US11694881B2Stage and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jul 4, 2023·1 cites·22 claims
- 0385US10665416B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted May 26, 2020·4 cites·19 claims
- 0485US9275837B2Plasma processing apparatusYAMAZAWA YOHEI·Filed 2010·Granted Mar 1, 2016·7 cites·8 claims
- 0579US11145490B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Oct 12, 2021·2 cites·11 claims
- 0679US9530619B2Plasma processing apparatus and filter unitTOKYO ELECTRON LTD·Filed 2014·Granted Dec 27, 2016·6 cites·17 claims
- 0778US11699576B2Filter device and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Jul 11, 2023·2 cites·8 claims
- 0875US10332728B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Jun 25, 2019·3 cites·19 claims
- 0974US10886109B2Stage and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Jan 5, 2021·1 cites·13 claims
- 1071US11495443B2Filter device and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Nov 8, 2022·1 cites·15 claims
- 1168US11908664B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Feb 20, 2024·0 cites·17 claims
- 1267US12334309B2Filter device and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Jun 17, 2025·0 cites·14 claims
- 1366US11456160B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Sep 27, 2022·1 cites·8 claims
- 1466US2025146917A1Method of measuring parameters of plasma, apparatus for measuring parameters of plasma, plasma processing system, and method of processing waferSAMSUNG ELECTRONICS CO LTD·Filed 2025·Application pending·0 cites
- 1563US2024355583A1Plasma processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1662US12222362B2Method of measuring parameters of plasma, apparatus for measuring parameters of plasma, plasma processing system, and method of processing waferSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Feb 11, 2025·0 cites·17 claims
- 1761US10096454B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Oct 9, 2018·1 cites·10 claims
- 1861US10074519B2Plasma processing apparatus and filter unitTOKYO ELECTRON LTD·Filed 2013·Granted Sep 11, 2018·1 cites·18 claims
- 1959US2025253128A1Substrate processing apparatus and substrate processing method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 2057US12210045B2Impedance measurement jig and method of controlling a substrate-processing apparatus using the jigSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Jan 28, 2025·0 cites·16 claims
- 2157US9754766B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Sep 5, 2017·1 cites·18 claims
- 2255US2024266144A1Substrate processing apparatus and substrate processing method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 2353US10546723B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2018·Granted Jan 28, 2020·0 cites·7 claims
- 2452US11501958B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Nov 15, 2022·0 cites·20 claims
- 2551US11037762B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Jun 15, 2021·0 cites·15 claims
- 2649US11538660B2Plasma processing apparatus and method of fabricating semiconductor device using sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Dec 27, 2022·0 cites·16 claims
- 2748US2013340937A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 2845US10897808B2Filter device and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Jan 19, 2021·0 cites·9 claims
- 2944US9646867B2Plasma processing apparatus, power supply unit and mounting table systemTOKYO ELECTRON LTD·Filed 2014·Granted May 9, 2017·0 cites·14 claims
- 3043US10651813B2Method for designing filterTOKYO ELECTRON LTD·Filed 2017·Granted May 12, 2020·0 cites·8 claims
- 3141US2010243609A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 3237US10763087B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Sep 1, 2020·0 cites·10 claims
- 3337US2019318914A1Processing apparatus and method for controlling processing apparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →