Inventor · disambiguated record
Scott A. Bell
Also filed as: BELL SCOTT · BELL SCOTT A · BELL SCOTT ALLAN
105 granted patents·7 pending applications·3,195 citations·filing 1995–2021
99Inventor score
Files withADVANCED MICRO DEVICES INC87CYPRESS SEMICONDUCTOR CORP11SPANSION LLC4BELL SCOTT A1BRENNAN MICHAEL1
Top patents by PatentIndex Score
112 records- 0198US6773998B1Modified film stack and patterning strategy for stress compensation and prevention of pattern distortion in amorphous carbon gate patterningADVANCED MICRO DEVICES INC·Filed 2003·Granted Aug 10, 2004·208 cites·22 claims
- 0298US6211044B1Process for fabricating a semiconductor device component using a selective silicidation reactionADVANCED MICRO DEVICES INC·Filed 1999·Granted Apr 3, 2001·242 cites·27 claims
- 0397US6500756B1Method of forming sub-lithographic spaces between polysilicon linesADVANCED MICRO DEVICES INC·Filed 2002·Granted Dec 31, 2002·168 cites·20 claims
- 0497US6383952B1RELACS process to double the frequency or pitch of small feature formationADVANCED MICRO DEVICES INC·Filed 2001·Granted May 7, 2002·140 cites·10 claims
- 0596US6541360B1Bi-layer trim etch process to form integrated circuit gate structuresADVANCED MICRO DEVICES INC·Filed 2001·Granted Apr 1, 2003·101 cites·26 claims
- 0696US6184128B1Method using a thin resist mask for dual damascene stop layer etchADVANCED MICRO DEVICES INC·Filed 2000·Granted Feb 6, 2001·139 cites·20 claims
- 0795US6534418B1Use of silicon containing imaging layer to define sub-resolution gate structuresADVANCED MICRO DEVICES INC·Filed 2001·Granted Mar 18, 2003·97 cites·20 claims
- 0894US6884733B1Use of amorphous carbon hard mask for gate patterning to eliminate requirement of poly re-oxidationADVANCED MICRO DEVICES INC·Filed 2002·Granted Apr 26, 2005·91 cites·25 claims
- 0994US6605514B1Planar finFET patterning using amorphous carbonADVANCED MICRO DEVICES INC·Filed 2002·Granted Aug 12, 2003·87 cites·20 claims
- 1092US6750127B1Method for fabricating a semiconductor device using amorphous carbon having improved etch resistanceADVANCED MICRO DEVICES INC·Filed 2003·Granted Jun 15, 2004·61 cites·9 claims
- 1192US6664154B1Method of using amorphous carbon film as a sacrificial layer in replacement gate integration processesADVANCED MICRO DEVICES INC·Filed 2002·Granted Dec 16, 2003·67 cites·20 claims
- 1292US6440640B1Thin resist with transition metal hard mask for via etch applicationADVANCED MICRO DEVICES INC·Filed 2000·Granted Aug 27, 2002·53 cites·20 claims
- 1391US6764949B2Method for reducing pattern deformation and photoresist poisoning in semiconductor device fabricationADVANCED MICRO DEVICES INC·Filed 2002·Granted Jul 20, 2004·53 cites·18 claims
- 1491US6420097B1Hardmask trim processADVANCED MICRO DEVICES INC·Filed 2000·Granted Jul 16, 2002·59 cites·17 claims
- 1590US6653190B1Flash memory with controlled wordline widthADVANCED MICRO DEVICES INC·Filed 2001·Granted Nov 25, 2003·44 cites·20 claims
- 1689US6900002B1Antireflective bi-layer hardmask including a densified amorphous carbon layerADVANCED MICRO DEVICES INC·Filed 2002·Granted May 31, 2005·45 cites·7 claims
- 1788US6642148B1RELACS shrink method applied for single print resist mask for LDD or buried bitline implants using chemically amplified DUV type photoresistADVANCED MICRO DEVICES INC·Filed 2002·Granted Nov 4, 2003·46 cites·16 claims
- 1888US6020269AUltra-thin resist and nitride/oxide hard mask for metal etchADVANCED MICRO DEVICES INC·Filed 1998·Granted Feb 1, 2000·92 cites·20 claims
- 1988US5767018AMethod of etching a polysilicon patternADVANCED MICRO DEVICES INC·Filed 1995·Granted Jun 16, 1998·90 cites·47 claims
- 2087US8652907B2Integrating transistors with different poly-silicon heights on the same dieLIN CHUAN·Filed 2011·Granted Feb 18, 2014·9 cites·15 claims
- 2186US7084071B1Use of multilayer amorphous carbon ARC stack to eliminate line warpage phenomenonADVANCED MICRO DEVICES INC·Filed 2002·Granted Aug 1, 2006·34 cites·23 claims
- 2285US6864556B1CVD organic polymer film for advanced gate patterningADVANCED MICRO DEVICES INC·Filed 2002·Granted Mar 8, 2005·30 cites·18 claims
- 2385US6548423B1Multilayer anti-reflective coating process for integrated circuit fabricationADVANCED MICRO DEVICES INC·Filed 2002·Granted Apr 15, 2003·32 cites·20 claims
- 2483US6989332B1Ion implantation to modulate amorphous carbon stressADVANCED MICRO DEVICES INC·Filed 2002·Granted Jan 24, 2006·26 cites·20 claims
- 2583US6596553B1Method of pinhole decoration and detectionADVANCED MICRO DEVICES INC·Filed 2002·Granted Jul 22, 2003·29 cites·20 claims
- 2680US6309926B1Thin resist with nitride hard mask for gate etch applicationADVANCED MICRO DEVICES INC·Filed 1998·Granted Oct 30, 2001·58 cites·28 claims
- 2779US9589805B2Split-gate semiconductor device with L-shaped gateCYPRESS SEMICONDUCTOR CORP·Filed 2014·Granted Mar 7, 2017·2 cites·8 claims
- 2879US6797552B1Method for defect reduction and enhanced control over critical dimensions and profiles in semiconductor devicesADVANCED MICRO DEVICES INC·Filed 2002·Granted Sep 28, 2004·22 cites·8 claims
- 2979US6423457B1In-situ process for monitoring lateral photoresist etchingADVANCED MICRO DEVICES INC·Filed 2000·Granted Jul 23, 2002·22 cites·20 claims
- 3079US6165695AThin resist with amorphous silicon hard mask for via etch applicationADVANCED MICRO DEVICES INC·Filed 1998·Granted Dec 26, 2000·57 cites·32 claims
- 3178US6635409B1Method of strengthening photoresist to prevent pattern collapseADVANCED MICRO DEVICES INC·Filed 2001·Granted Oct 21, 2003·16 cites·19 claims
- 3278US6127070AThin resist with nitride hard mask for via etch applicationADVANCED MICRO DEVICES INC·Filed 1998·Granted Oct 3, 2000·53 cites·2 claims
- 3377US7285499B1Polymer spacers for creating sub-lithographic spacesADVANCED MICRO DEVICES INC·Filed 2005·Granted Oct 23, 2007·7 cites·17 claims
- 3477US6340603B1Plasma emission detection during lateral processing of photoresist maskADVANCED MICRO DEVICES INC·Filed 2000·Granted Jan 22, 2002·19 cites·20 claims
- 3577US6107172AControlled linewidth reduction during gate pattern formation using an SiON BARCADVANCED MICRO DEVICES INC·Filed 1997·Granted Aug 22, 2000·54 cites·19 claims
- 3676US7928005B2Method for forming narrow structures in a semiconductor deviceADVANCED MICRO DEVICES INC·Filed 2005·Granted Apr 19, 2011·5 cites·16 claims
- 3775US7052921B1System and method using in situ scatterometry to detect photoresist pattern integrity during the photolithography processADVANCED MICRO DEVICES INC·Filed 2004·Granted May 30, 2006·16 cites·12 claims
- 3875US6200907B1Ultra-thin resist and barrier metal/oxide hard mask for metal etchADVANCED MICRO DEVICES INC·Filed 1998·Granted Mar 13, 2001·46 cites·20 claims
- 3975US6121123AGate pattern formation using a BARC as a hardmaskADVANCED MICRO DEVICES INC·Filed 1997·Granted Sep 19, 2000·45 cites·14 claims
- 4074US7498222B1Enhanced etching of a high dielectric constant layerADVANCED MICRO DEVICES INC·Filed 2006·Granted Mar 3, 2009·6 cites·15 claims
- 4174US6140023AMethod for transferring patterns created by lithographyADVANCED MICRO DEVICES INC·Filed 1998·Granted Oct 31, 2000·33 cites·30 claims
- 4274US5963841AGate pattern formation using a bottom anti-reflective coatingADVANCED MICRO DEVICES INC·Filed 1997·Granted Oct 5, 1999·45 cites·18 claims
- 4373US6262435B1Etch bias distribution across semiconductor waferFiled 1998·Granted Jul 17, 2001·36 cites·6 claims
- 4473US5990524ASilicon oxime spacer for preventing over-etching during local interconnect formationADVANCED MICRO DEVICES INC·Filed 1997·Granted Nov 23, 1999·40 cites·20 claims
- 4573US5965461AControlled linewidth reduction during gate pattern formation using a spin-on barcADVANCED MICRO DEVICES INC·Filed 1997·Granted Oct 12, 1999·45 cites·20 claims
- 4672US9466496B2Spacer formation with straight sidewallSPANSION LLC·Filed 2013·Granted Oct 11, 2016·2 cites·15 claims
- 4771US7675104B2Integrated circuit memory system employing silicon rich layersSPANSION LLC·Filed 2006·Granted Mar 9, 2010·3 cites·10 claims
- 4871US6803178B1Two mask photoresist exposure pattern for dense and isolated regionsADVANCED MICRO DEVICES INC·Filed 2001·Granted Oct 12, 2004·16 cites·35 claims
- 4971US6171763B1Ultra-thin resist and oxide/nitride hard mask for metal etchADVANCED MICRO DEVICES INC·Filed 1998·Granted Jan 9, 2001·38 cites·26 claims
- 5070US7465644B1Isolation region bird's beak suppressionADVANCED MICRO DEVICES INC·Filed 2005·Granted Dec 16, 2008·5 cites·24 claims
Showing the top 50 of 112 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →