Inventor · disambiguated record
Azeddine Zerrade
Also filed as: ZERRADE AZEDDINE
12 granted patents·1 pending application·14 citations·filing 2003–2021
83Inventor score
Top patents by PatentIndex Score
13 records- 0193US11300871B2Extreme ultraviolet mask absorber materialsAPPLIED MATERIALS INC·Filed 2020·Granted Apr 12, 2022·3 cites·20 claims
- 0284US7767365B2Methods for forming and cleaning photolithography reticlesMICRON TECHNOLOGY INC·Filed 2006·Granted Aug 3, 2010·7 cites·51 claims
- 0365US11789358B2Extreme ultraviolet mask blank defect reductionAPPLIED MATERIALS INC·Filed 2021·Granted Oct 17, 2023·0 cites·20 claims
- 0464US11640109B2Extreme ultraviolet mask absorber materialsAPPLIED MATERIALS INC·Filed 2021·Granted May 2, 2023·0 cites·20 claims
- 0564US11630385B2Extreme ultraviolet mask absorber materialsAPPLIED MATERIALS INC·Filed 2021·Granted Apr 18, 2023·0 cites·20 claims
- 0664US11556053B2Extreme ultraviolet mask blank hard mask materialsAPPLIED MATERIALS INC·Filed 2021·Granted Jan 17, 2023·0 cites·20 claims
- 0764US11537040B2Extreme ultraviolet mask blank hard mask materialsAPPLIED MATERIALS INC·Filed 2021·Granted Dec 27, 2022·0 cites·20 claims
- 0863US11860533B2Extreme ultraviolet mask absorber materialsAPPLIED MATERIALS INC·Filed 2021·Granted Jan 2, 2024·0 cites·20 claims
- 0959US11669008B2Extreme ultraviolet mask blank defect reduction methodsAPPLIED MATERIALS INC·Filed 2020·Granted Jun 6, 2023·0 cites·20 claims
- 1057US7147974B2Methods for converting reticle configurationsMICRON TECHNOLOGY INC·Filed 2003·Granted Dec 12, 2006·4 cites·51 claims
- 1154US11454876B2EUV mask blank absorber defect reductionAPPLIED MATERIALS INC·Filed 2020·Granted Sep 27, 2022·0 cites·20 claims
- 1254US7592105B2Methods for converting reticle configurations and methods for modifying reticlesMICRON TECHNOLOGY INC·Filed 2006·Granted Sep 22, 2009·0 cites·20 claims
- 1347US2021124253A1Extreme ultraviolet mask blank defect reduction methodsAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
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