Inventor · disambiguated record
Matthew I. Egbe
Also filed as: EGBE MATTHEW · EGBE MATTHEW I
14 granted patents·8 pending applications·188 citations·filing 2002–2016
93Inventor score
Top patents by PatentIndex Score
22 records- 0196US7700533B2Composition for removal of residue comprising cationic salts and methods using sameAIR PROD & CHEM·Filed 2006·Granted Apr 20, 2010·66 cites·23 claims
- 0290US7674755B2Formulation for removal of photoresist, etch residue and BARCAIR PROD & CHEM·Filed 2006·Granted Mar 9, 2010·15 cites·23 claims
- 0390US7129029B2Compositions substrate for removing etching residue and use thereofAIR PROD & CHEM·Filed 2006·Granted Oct 31, 2006·13 cites·25 claims
- 0487US8030263B2Composition for stripping and cleaning and use thereofAIR PROD & CHEM·Filed 2005·Granted Oct 4, 2011·14 cites·21 claims
- 0586US7687447B2Semi-aqueous stripping and cleaning composition containing aminobenzenesulfonic acidAIR PROD & CHEM·Filed 2008·Granted Mar 30, 2010·11 cites·20 claims
- 0681US8231733B2Aqueous stripping and cleaning compositionEGBE MATTHEW I·Filed 2005·Granted Jul 31, 2012·7 cites·19 claims
- 0779US6943142B2Aqueous stripping and cleaning compositionAIR PROD & CHEM·Filed 2002·Granted Sep 13, 2005·20 cites·13 claims
- 0877US8110535B2Semi-aqueous stripping and cleaning formulation for metal substrate and methods for using sameEGBE MATTHEW I·Filed 2010·Granted Feb 7, 2012·3 cites·1 claims
- 0975USRE42128ECompositions for removing residue from a substrate and use thereofAIR PROD & CHEM·Filed 2009·Granted Feb 8, 2011·3 cites·53 claims
- 1075US7166419B2Compositions substrate for removing etching residue and use thereofAIR PROD & CHEM·Filed 2002·Granted Jan 23, 2007·13 cites·21 claims
- 1170US7361631B2Compositions for the removal of organic and inorganic residuesAIR PROD & CHEM·Filed 2004·Granted Apr 22, 2008·14 cites·10 claims
- 1266US8440599B2Composition for stripping and cleaning and use thereofEGBE MATTHEW I·Filed 2011·Granted May 14, 2013·2 cites·21 claims
- 1358US8357646B2Stripper for dry film removalAIR PROD & CHEM·Filed 2009·Granted Jan 22, 2013·1 cites·10 claims
- 1452US2008096785A1Stripper Containing an Acetal or Ketal for Removing Post-Etched Photo-Resist, Etch Polymer and ResidueAIR PROD & CHEM·Filed 2007·Application pending·0 cites
- 1551US9217929B2Composition for removing photoresist and/or etching residue from a substrate and use thereofEGBE MATTHEW I·Filed 2004·Granted Dec 22, 2015·6 cites·19 claims
- 1651US2014100151A1Stripping and Cleaning Compositions for Removal of Thick Film ResistAIR PROD & CHEM·Filed 2013·Application pending·0 cites
- 1747US2016152930A1Stripping and Cleaning Compositions for Removal of Thick Film ResistAIR PROD & CHEM·Filed 2016·Application pending·0 cites
- 1843US2009229629A1Stripper For Copper/Low k BEOL CleanAIR PROD & CHEM·Filed 2009·Application pending·0 cites
- 1942US2004198627A1Process and apparatus for removing residues from the microstructure of an objectKOBE STEEL LTD·Filed 2004·Application pending·0 cites
- 2042US2006003910A1Composition and method comprising same for removing residue from a substrateHSU JIUN Y·Filed 2005·Application pending·0 cites
- 2141US2012295828A1Composition for Removing Photoresist and/or Etching Residue From a Substrate and Use ThereofEGBE MATTHEW I·Filed 2012·Application pending·0 cites
- 2239US2002164873A1Process and apparatus for removing residues from the microstructure of an objectFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →