Inventor · disambiguated record
John R. Alvis
Also filed as: ALVIS JOHN R
11 granted patents·2 pending applications·526 citations·filing 1986–2012
93Inventor score
Top patents by PatentIndex Score
13 records- 0190US5279978AProcess for making BiCMOS device having an SOI substrateMOTOROLA INC·Filed 1992·Granted Jan 18, 1994·81 cites·10 claims
- 0290US5212397ABiCMOS device having an SOI substrate and process for making the sameMOTOROLA INC·Filed 1990·Granted May 18, 1993·81 cites·10 claims
- 0389US4728619AField implant process for CMOS using germaniumMOTOROLA INC·Filed 1987·Granted Mar 1, 1988·88 cites·22 claims
- 0488US4693781ATrench formation processMOTOROLA INC·Filed 1986·Granted Sep 15, 1987·73 cites·14 claims
- 0581US4743563AProcess of controlling surface dopingMOTOROLA INC·Filed 1987·Granted May 10, 1988·45 cites·10 claims
- 0680US4928156AN-channel MOS transistors having source/drain regions with germaniumMOTOROLA INC·Filed 1989·Granted May 22, 1990·54 cites·5 claims
- 0775US4748134AIsolation process for semiconductor devicesMOTOROLA INC·Filed 1987·Granted May 31, 1988·44 cites·13 claims
- 0869US4837173AN-channel MOS transistors having source/drain regions with germaniumMOTOROLA INC·Filed 1987·Granted Jun 6, 1989·34 cites·9 claims
- 0968US7998822B2Semiconductor fabrication process including silicide stringer removal processingFREESCALE SEMICONDUCTOR INC·Filed 2008·Granted Aug 16, 2011·2 cites·21 claims
- 1055US4704367ASuppression of hillock growth through multiple thermal cycles by argon implantationALVIS JOHN R·Filed 1986·Granted Nov 3, 1987·24 cites·10 claims
- 1154US2013313668A1Photronic device with reflector and method for formingSPENCER GREGORY S·Filed 2012·Application pending·0 cites
- 1250US7446006B2Semiconductor fabrication process including silicide stringer removal processingFREESCALE SEMICONDUCTOR INC·Filed 2005·Granted Nov 4, 2008·0 cites·7 claims
- 1333US2002187651A1Method for making a semiconductor deviceFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →